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机构地区:[1]Centre of Micro/Nano Manufacturing Technology(MNMT-Dublin),University College Dublin,Dublin 4,Ireland [2]School of Control Engineering,Northeastern University at Qinhuangdao,Qinhuangdao 066004,China [3]State Key Laboratory of Precision Measuring Technology and Instruments,Centre of Micro/Nano Manufacturing Technology(MNMT),Tianjin University,Tianjin 300072,China
出 处:《Frontiers of Mechanical Engineering》2021年第1期1-31,共31页机械工程前沿(英文版)
基 金:funding from the Enterprise Ireland and from the European Union’s Horizon 2020 Research and Innovation Programme under the Marie Skłodowska-Curie grant agreement(Grant No.713654);the National Natural Science Foundation of China(Grant No.51705070);the Science Foundation Ireland(SFI)(Grant No.15/RP/B3208).
摘 要:Optical interferometry is a powerful tool for measuring and characterizing areal surface topography in precision manufacturing.A variety of instruments based on optical interferometry have been developed to meet the measurement needs in various applications,but the existing techniques are simply not enough to meet the ever-increasing requirements in terms of accuracy,speed,robustness,and dynamic range,especially in on-line or on-machine conditions.This paper provides an in-depth perspective of surface topography reconstruction for optical interferometric measurements.Principles,configurations,and applications of typical optical interferometers with different capabilities and limitations are presented.Theoretical background and recent advances of fringe analysis algorithms,including coherence peak sensing and phase-shifting algorithm,are summarized.The new developments in measurement accuracy and repeatability,noise resistance,self-calibration ability,and computational efficiency are discussed.This paper also presents the new challenges that optical interferometry techniques are facing in surface topography measurement.To address these challenges,advanced techniques in image stitching,on-machine measurement,intelligent sampling,parallel computing,and deep learning are explored to improve the functional performance of optical interferometry in future manufacturing metrology.
关 键 词:surface topography MEASUREMENT optical interferometry coherence envelope phase-shifting algorithm
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