基于傅里叶叠层显微成像的LED阵列位置校正方法  

LED Array Position Correction Method Based on Fourier Ptychographic Microscopy

作　　者：毛海锋 赵巨峰[1] 崔光茫 吴小辉 Mao Haifeng;Zhao Jufeng;Cui Guangmang;Wu Xiaohui(School of Electronics and Information,Hangzhou Dianzi University,Hangzhou,Zhejiang 310018,China)

机构地区：[1]杭州电子科技大学电子信息学院,浙江杭州310018

出　　处：《光学学报》2021年第4期97-107,共11页Acta Optica Sinica

基　　金：浙江省自然科学基金(LY18F050007);国家自然科学基金(61805063);浙江省基础公益项目(LGF20F050003);浙江省科协“育才工程”项目(SKX201901)。

摘　　要：傅里叶叠层显微成像(FPM)利用LED阵列角度变化的光照来克服低数值孔径物镜的分辨率限制。在传统的FPM系统中,LED阵列的位置误差将会给图像重建过程带来严重影响。因此准确校正LED阵列的位置对于提高重建图像质量至关重要。为了解决这一问题,提出一种基于遗传退火优化算法的位置校正方法。首先分析LED阵列、样品及物镜数值孔径的相对位置给入射波矢量带来的影响;接着采用遗传退火优化算法对LED阵列的误差位置估计全局误差参数;最后在重建过程中利用全局误差参数快速、准确地对LED阵列位置进行校正。仿真结果和实验结果表明,所提方法能显著提高重建图像的质量。Fourier ptychographic microscopy(FPM)uses illumination of LED array with angle change to overcome the resolution limitations of low numerical aperture objectives.In an original FPM system,position errors of an LED array severely impact an image reconstruction process.Therefore,accurately correcting the position of an LED array is very important to improve the quality of reconstructed images.To solve this problem,the study proposes a position correction method based on a genetic annealing optimization algorithm.First,the influence of the following three factors’relative positions on an incident wave vector is analyzed:the LED array,sample,and numerical aperture of objective lens.Next,the genetic annealing optimization algorithm is utilized in estimating global error parameters for LED array error locations.Finally,global error parameters are used to quickly and accurately correct the position of the LED array during the reconstruction process.Both simulation and experimental results indicate that the proposed method can significantly improve the quality of FPM reconstructed images.

关 键 词：成像系统 傅里叶叠层显微成像 位置校正 遗传退火算法 图像质量 

分 类 号：O436[机械工程—光学工程]