(Ti,Al,Cr)N膜系的研究进展  

Research Progress of(Ti,Al,Cr)N Hard Film System

作　　者：刘聪 张钧 张热寒 李宁 LIU Cong;ZHANG Jun;ZHANG Re-han;LI Ning(Key Laboratory of Multi-group Hard Film Research and Application in Liaoning Province,Shenyang 110044,China;College of Mechanical Engineering,Shenyang University,Shenyang 110044,China)

机构地区：[1]辽宁省多组硬质膜研究及应用重点实验室,辽宁沈阳110044 [2]沈阳大学机械工程学院,辽宁沈阳110044

出　　处：《材料保护》2021年第3期131-136,共6页Materials Protection

基　　金：辽宁省自然科学基金项目(2015020216)资助。

摘　　要：总结了(Ti,Al,Cr)N膜系的沉积方法并讨论了化学成分、N2流量以及基底偏压等工艺参数对薄膜产生的影响,针对(Ti,Al,Cr)N膜系的相组成与膜层成分、抗氧化性、耐腐蚀性、显微硬度、抗摩擦磨损性能以及膜基结合力等方面进行了详细阐述。在此基础上,对(Ti,Al,Cr)N膜系的未来发展进行了展望,以期为多组元氮化物硬质膜的研究提供参考。In this work,the deposition method of(Ti,Al,Cr)N film system was summarized,and the effects of the chemical composition,N2 flow rate,the substrate bias voltage on the films were discussed.The phase composition,the film composition,the oxidation resistance,the corrosion resistance,the microhardness,the friction and wear resistance and the adhesion of(Ti,Al,Cr)N films were described in detail.Based on the above,the future development of(Ti,Al,Cr)N films was prospected so as to provide reference for the further research of multi-component nitride hard films.

关 键 词：(Ti Al Cr)N系硬质膜 抗氧化性 耐腐蚀性 显微硬度 抗摩擦磨损性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]