低熔点光学玻璃表面加工工艺参数优化  

Optimization of Process Parameters for Surface Processing of Optical Glass with Low Melting Point

作　　者：薛阳韩江 郭忠达[1] 李宏 XUE Yanghanjiang;GUO Zhongda;LI Hong(School of Optoelectronic Engineering,Xi’an Technological University,Xi’an 710021,China)

机构地区：[1]西安工业大学光电工程学院,西安710021

出　　处：《西安工业大学学报》2021年第2期153-158,共6页Journal of Xi’an Technological University

基　　金：自由曲面光学元件制造技术研究项目(ZSKJ201801)。

摘　　要：为优化磁流变抛光对低熔点玻璃表面的加工工艺,文中利用磁流变抛光技术对低熔点玻璃进行抛光,分析了磁流变抛光中工艺参数对低熔点光学材料对表面粗糙度的影响,探讨低熔点玻璃通过冷加工的方法进行超光滑加工的效果。实验研究表明:在抛光液质量分数为15%、磨盘转速为35 r·min^(-1)、抛光时间为50 min条件下,磁流变抛光对低熔点玻璃的表面粗糙度小于1 nm,达到超光滑加工技术水平。The study is intended to optimize the technology for surface processing of the glass with low melting point by MR polishing.This paper analyzes the influence of the process parameters on the surface roughness of optical materials with low melting point when they are MR polished,and discusses the effect of ultra-smooth processing of low melting point glass by cold machining.The experimental results show that under the conditions of 15%mass fraction of polishing solution,35 r·min^(-1) grinding disc rotation speed and 50 min polishing time,the surface roughness of the magnetorheologically polished glass is less than 1nm,reaching the technical level of ultra smooth processing.

关 键 词：磁流变抛光 低熔点玻璃 工艺参数 表面粗糙度 

分 类 号：TB321[一般工业技术—材料科学与工程]