镁合金表面电弧离子镀TiAlN薄膜的结构与性能研究  

Structure and Properties of TiAlN Films by Arc Ion Plating on Mg Alloys

作　　者：王晓奇[1] 曹慧[2] 雷彪[1] WANG Xiaoqi;CAO Hui;LEI Biao(Department of Electromechanical,Inner Mongolia Technical College of Mechanics and Electrics,Hohhot 010070,China;Department of Metallurgy and Materials Engineering,Inner Mongolia Technical College of Mechanics and Electrics,Hohhot 010070,China)

机构地区：[1]内蒙古机电职业技术学院机电工程系,内蒙古呼和浩特010070 [2]内蒙古机电职业技术学院冶金与材料工程系,内蒙古呼和浩特010070

出　　处：《电镀与精饰》2021年第6期25-29,共5页Plating & Finishing

摘　　要：镁合金抗腐蚀性能差,其腐蚀电位在实用金属中最负。针对这一问题采用表面镀膜的方法,在三组镁合金基体上采用电弧离子镀方法在相同的参数下制备了Al原子掺杂的TiAlN薄膜。通过XRD和SEM研究了不同镁合金基体上薄膜的微观结构;采用电化学极化曲线、Nyquist图和腐蚀形貌分析了不同基体上薄膜的耐蚀性能,采用划痕仪得到了膜基结合强度。结果表明:薄膜由TiN、AlN和TiAlN三种物相组成,沉积在不同基体上薄膜的衍射峰强度和择优取向不同,薄膜表面形貌及粗糙度受基体前处理状态的影响,镀膜后的镁合金基体的腐蚀电位有明显的提高,腐蚀电流密度下降了两个数量级,阻抗值约为基体的25倍。其中,Al6Zn1Mg1.5Ce镀膜基体的耐蚀性能最佳,并且与基体的结合力L_(c1)大于20 N。The corrosion potential of magnesium alloys is the most negative among practical metals,and their corrosion resistance is very poor.To solve this problem,Al atom doped TiAlN films were prepared by arc ion plating on three groups of magnesium alloys with the same parameters.The microstructure of the films was studied by means of XRD and SEM,the corrosion resistance was evaluated by means of electrochemical polarization curves,Nyquist plots and corrosion morphology,and the adhesion strength of the films was obtained by means of scratch instrument.The results showed that the films were composed of TiN,AlN and TiAlN phases.The diffraction peak intensity and preferred orientation of the films deposited on different substrates were different.The surface morphology and roughness of the films were influenced by the pretreatment condition of the substrates.The corrosion potential of the coated substrate increased obviously,and the corrosion current density decreased by two orders of magnitude,the impedance value of the coating was about 25 times that of the substrate.The corrosion resistance of coating deposited on Al6Zn1Mg1.5Ce was the best,and the binding force of the film L_(c1)was greater than 20 N.

关 键 词：镁合金 TiAlN膜 电化学腐蚀 结构 结合力 

分 类 号：TG174.442[金属学及工艺—金属表面处理]