N/Ti原子比对TiN膜微结构及性能的影响综合分析  

Effects of N/Ti Atomic Ratio on Microstructure and Properties of TiN Films

作　　者：彭立静 张钧[1] 徐晨宁 王晓阳[1] 王美涵[1] PENG Li-jing;ZHANG Jun;XU Chen-ning;WANG Xiao-yang;WANG Mei-han(College of Mechanical Engineering,Shenyang University,Key Laboratory of Research and Application of Multiple Hard Films,Shenyang 110044,China)

机构地区：[1]沈阳大学机械工程学院辽宁省多组硬质膜研究及应用重点实验室,辽宁沈阳110044

出　　处：《材料保护》2021年第4期127-132,共6页Materials Protection

基　　金：辽宁省高等学校创新人才支持计划项目(LR2019044)资助。

摘　　要：TiN硬质膜是很多现有的多组元氮化物硬质膜的基础。N/Ti原子比对TiN硬质膜具有重要影响。结合TiN硬质膜的制备工艺方法,分析了膜层中N含量变化的影响因素及控制方法,详细讨论了N/Ti原子比对TiN膜相组成、硬度、耐摩擦磨损性能、光电性能的影响关系。TiN hard films are the basis of many existing multi-component nitride hard films.The N/Ti atomic ratio has important influences on TiN hard films.Based on the preparation process methods of TiN hard films,the influencing factors and control ways of the change of N content in the films were discussed.Besides,the influences of N/Ti atomic ratio on the phase composition,hardness,wear and abrasion resistance and the photoelectric properties of TiN films were analyzed in detail.

关 键 词：TiN硬质膜 N/Ti原子比 显微硬度 光电性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]