CoSiB/Pt多层膜垂直磁各向异性及热稳定性  

Perpendicular magnetic anisotropy and thermal stability in CoSiB/Pt multilayers

作　　者：王桂玲 赵泽军 刘帅[1] 息剑峰 李宝河[1] WANG Gui-ling;ZHAO Ze-jun;LIU Shuai;XI Jian-feng;LI Bao-he(School of Science,Beijing Technology and Business University,Beijing 100048,China)

机构地区：[1]北京工商大学理学院,北京100048

出　　处：《材料工程》2021年第6期26-32,共7页Journal of Materials Engineering

基　　金：北京市教育委员会2018科技计划重点项目(KZ201810011013);北京工商大学科研团队建设项目(19005902016);2020年研究生科研能力提升计划项目(2020-001)。

摘　　要：采用磁控溅射方法在单面附有300 nm SiO_(2)的单晶硅基片上制备了以Pt为底层的CoSiB/Pt多层膜样品。CoSiB/Pt层周期数确定为2,对样品底层厚度及周期层厚度进行调制,根据反常霍尔效应系统地研究了CoSiB/Pt多层膜垂直磁各向异性(perpendicular magnetic anisotropy,PMA)及薄膜的热稳定性。通过对这些参数的调节获得了具有良好垂直磁各向异性的最佳多层膜样品结构Pt(1)/[CoSiB(0.5)/Pt(1)]_(2),底层Pt和周期层中CoSiB,Pt的最佳厚度分别为1,0.5 nm和1 nm。对最佳样品进行XRD图谱分析,磁滞回线测量以及一系列退火处理。结果表明,样品具有明显的(111)_(CoPt)衍射峰,形成了较好的(111)织构,界面耦合增强,结晶度较好,计算出样品的有效磁各向异性常数K_(eff)达到5.11×10^(4)J·m^(-3),样品具有良好的PMA;当退火温度为200℃时,样品的CoPt(111)峰强度显著增强,界面形成了较强的(111)织构,K_(eff)达到最大值1.0×10^(5)J·m^(-3),当退火温度不超过400℃时,样品仍能保持良好的PMA。多层膜样品结构Pt(1)/[CoSiB(0.5)/Pt(1)]_(2)具有良好的PMA和热稳定性,且合适的退火温度有利于提高样品的PMA。The CoSiB/Pt multilayers with Pt buffer layer were successfully manufactured by magnetron sputtering technique on the Si substrate with 300 nm of SiO_(2).The optimal period of the CoSiB/Pt bilayer was 2.The thickness of CoSiB/Pt bilayer and Pt buffer layer were modulated.The perpendicular magnetic anisotropy(PMA)of each of the samples and thermal stability were studied by anomalous Hall effect(AHE)method.The best structure was Pt(1)/[CoSiB(0.5)/Pt(1)]_(2).The optimal thicknesses of Pt buffer layer and CoSiB/Pt bilayer in the periodic multilayer were 1,0.5 nm and 1 nm,respectively.The XRD analysis,hysteresis loop measurement and a series of annealing treatment of the best sample were conducted.The results show that the sample has obvious(111)_(CoPt)diffraction peak,forms a good(111)texture,enhanced interface coupling and good crystallinity.The effective magnetic anisotropy constant K_(eff)of the sample is calculated to reach 5.11×10^(4)J·m^(-3);when the annealing temperature is 200℃,the intensity of(111)CoPt diffraction peak of the sample is significantly enhanced,a strong(111)texture is formed at the interface,and the K_(eff)reaches a maximum value of 1.0×10^(5)J·m^(-3).When the annealing temperature is no more than 400℃,the sample can still maintain good PMA.Multilayer film sample structure Pt(1)/[CoSiB(0.5)/Pt(1)]_(2)has good PMA and thermal stability,and the suitable annealing temperature is conducive to improving the sample’s PMA.

关 键 词：CoSiB/Pt多层膜 反常霍尔效应 垂直磁各向异性 有效磁各向异性常数 

分 类 号：O469[理学—凝聚态物理]