铝阳极氧化厚膜工艺及主要影响因素控制  

Thick Film Process of Aluminium Anodizing and Control of Main Influencing Factors

作　　者：黄允芳[1] HUANG Yun-fang(Jiangsu Vocational College of Business,Zhejiang Nantong 226011,China)

机构地区：[1]江苏商贸职业学院,江苏南通226011

出　　处：《广州化工》2021年第12期154-156,共3页GuangZhou Chemical Industry

摘　　要：在单一硫酸溶液中生产≥25μm铝阳极氧化厚膜,不能沿用普通的铝阳极氧化工艺。在分析铝阳极氧化膜生成过程基础上,对该种厚膜的生产工艺进行了研究。几个主要工艺参数确定为:硫酸溶液155-165 g/L、对普通料Al^(3+)≯18 g/L、对黑色料Al^(3+)≯15 g/L、槽液温度17-19℃、电流密度1.5-1.6 A/dm^(2)。最后对影响该种厚膜产品质量的几个主要因素进行了分析,并提出了具体的控制要求。Thick film(≥25μm)obtained by single sulphuric acid solution can t be made by ordinary anodizing process.With the help of analysis for the generation process of the aluminum anodizing film,production process of the thick film was studied.Several main process parameters determined by result determination were as follows:H_(2)SO_(4) was 155-165 g/L,Al^(3+)≯18 g/L to common material and Al^(3+)≯15 g/L to black material,temperature was 17-19℃,current density 1.5-1.6 was A/dm^(2).Finally,several main influencing factors were analyzed and specific control requirements were proposed for product quality of the thick film.

关 键 词：铝 阳极氧化 厚膜 影响因素 

分 类 号：TQ153.6[化学工程—电化学工业]