Dry-etched ultrahigh-Q silica microdisk resonators on a silicon chip  

作　　者：JIAXIN GU JIE LIU ZIQI BAI HAN WANG XINYU CHENG GUANYU LI MENGHUA ZHANG XINXIN LI QI SHI MIN XIAO XIAOSHUN JIANG 

机构地区：[1]National Laboratory of Solid State Microstructures,College of Engineering and Applied Science and School of Physics,Nanjing University,Nanjing 210093,China [2]Department of Physics,University of Arkansas,Fayetteville,Arkansas 72701,USA

出　　处：《Photonics Research》2021年第5期722-725,共4页光子学研究（英文版）

基　　金：National Key Research and Development Program of China(2016YFA0302500,2017YFA0303703);National Natural Science Foundation of China(NFSC)(61922040,11621091);Fundamental Research Funds for the Central Universities(021314380149)。

摘　　要：We demonstrate the fabrication of ultrahigh quality(Q) factor silica microdisk resonators on a silicon chip by inductively coupled plasma(ICP) etching. We achieve a dry-etched optical microresonator with an intrinsic Q factor as high as 1.94×10^(8) from a 1-mm-diameter silica microdisk with a thickness of 4 μm. Our work provides a chip-based microresonator platform operating in the ultrahigh-Q region that will be useful in nonlinear photonics such as Brillouin lasers and Kerr microcombs.

关 键 词：RESONATOR SILICA ultrahigh 

分 类 号：TN751.2[电子电信—电路与系统]