全息离子束摆动刻蚀凸面闪耀光栅制备技术  

Fabrication of convex blazed grating by holographic ion beam swing etching

作　　者：仲健魁 黄元申[1,2,3] 倪争技 徐邦联[1,2] 张大伟 ZHONG Jiankui;HUANG Yuanshen;NI Zhengji;XU Banglian;ZHANG Dawei(Engineering Research Center of Optical Instruments and Systems,University of Shanghai for Science and Technology,Ministry of Education,Shanghai 200093,China;Shanghai Key Laboratory of Modern Optical System,University of Shanghai for Science and Technology,Shanghai 200093,China;Shanghai Institute of Optical Instruments,Shanghai 200093,China)

机构地区：[1]上海理工大学教育部光学仪器与系统工程研究中心,上海200093 [2]上海理工大学上海市现代光学系统重点实验室,上海200093 [3]上海光学仪器研究所,上海200093

出　　处：《光学仪器》2021年第3期86-94,共9页Optical Instruments

基　　金：国家重点研发计划(2016YFF0101904);国家自然科学基金天文联合基金(U1831133)。

摘　　要：高衍射效率的凸面闪耀光栅是高光谱分辨率成像光谱仪的核心分光元件,其制作方法包括机械刻划法、电子束直写法、X射线光刻法、全息离子束刻蚀法等,其中全息离子束刻蚀法因为具备良好的各向异性,不受尺寸与曲面形状限制,杂散光低,完全没有鬼线,制造时间短等优点成为现今光栅制造领域常用方法之一。传统全息离子束刻蚀凸面光栅时基底的弯曲会导致槽形闪耀角的不一致性,并且在制作小闪耀角凸面光栅时基底表面会有部分区域无法被刻蚀和槽形曲面不连续的现象,而摆动刻蚀凸面闪耀光栅可以克服上述缺点。对全息离子束刻蚀方法制作凸面闪耀光栅多方面进行了综述。The high diffraction efficiency convex blazed grating is the core spectroscopic element of the current high spectral resolution imaging spectrometer.Its fabrication methods include mechanical etching,electron beam etching,X-ray lithography,holographic ion beam etching and so on.Each has its own advantages and disadvantages.Holographic ion beam etching is one of the most commonly used methods in the field of grating manufacturing because of its good anisotropy,no limitation of size and surface shape,low stray light,no ghost line and short manufacturing time.When traditional holographic ion beam is used to etch convex gratings,the curvature of the substrate leads to the inconsistency of the groove blazed angle. In addition, when the convex grating with small blaze angle is fabricated, some areas on the substrate surface cannot be etched and the groove surface is discontinuous. However, swing etching convex blazed grating can overcome the above disadvantages. In this paper, the fabrication of convex blazed grating by holographic ion beam etching is reviewed.

关 键 词：凸面光栅 全息离子束刻蚀 闪耀角 

分 类 号：O436.1[机械工程—光学工程]