Preparation of rutile TiO_(2) thin films by laser chemical vapor deposition method  

作　　者：Dongyun GUO Akihiko ITO Takashi GOTO Rong TU Chuanbin WANG Qiang SHEN Lianmeng ZHANG 

机构地区：[1]State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,and School of Materials Science and Engineering,Wuhan University of Technology,Wuhan 430070,China [2]Institute for Materials Research,Tohoku University,Sendai 980-8577,Japan

出　　处：《Journal of Advanced Ceramics》2013年第2期162-166,共5页先进陶瓷（英文）

基　　金：This work was supported in part by the Global COE Program of the Materials Integration,Tohoku University,and the International Science and Technology Cooperation Program of China(Grant No.2009DFB50470);This work was also supported in part by the International Science and Technology Cooperation Project of Hubei Province(Grant No.2010BFA017)and the 111 Project of China(Grant No.B13035).

摘　　要：TiO_(2) thin films were prepared on Pt/Ti/SiO_(2)/Si substrate by laser chemical vapor deposition(LCVD)method.The effects of laser power(P_(L))and total pressure(p_(tot))on the microstructure of TiO_(2) thin films were investigated.The deposition temperature(T_(dep))was mainly affected by P_(L),increasing with P_(L) increasing.The single-phase rutile TiO_(2) thin films with different morphologies were obtained.The morphologies of TiO_(2) thin films were classified into three typical types,including the powdery,Wulff-shaped and granular microstructures.p_(tot) and T_(dep) were the two critical factors that could be effectively used for controlling the morphology of the films.

关 键 词：rutile TiO_(2)thin film laser chemical vapor deposition(LCVD) laser power total pressure microstructure 

分 类 号：TB3[一般工业技术—材料科学与工程]