Emergent strain engineering of multiferroic BiFeO_(3) thin films  

作　　者：Fei Sun Deyang Chen Xingsen Gao Jun-Ming Liu 

机构地区：[1]Institute for Advanced Materials,South China Academy of Advanced Optoelectronics,South China Normal University,Guangzhou,510006,China [2]Guangdong Provincial Key Laboratory of Optical Information Materials and Technology,South China Academy of Advanced Optoelectronics,South China Normal University,Guangzhou,510006,China [3]Laboratory of Solid State Microstructures and Innovation Center of Advanced Microstructures,Nanjing University,Nanjing,210093,China

出　　处：《Journal of Materiomics》2021年第2期281-294,共14页无机材料学学报（英文）

基　　金：supported by the National Key Research and Development Program of China(No.2016YFA0201002);the National Natural Science Foundation of China(Grant Nos.11704130,U1832104 and 91963102);Authors also acknowledge the the financial support of Guangdong Science and Technology ProjectInternational Cooperation(Grant No.2019A050510036);the Natural Science Foundation of Guangdong Province(Grant No.2017A30310169);D.C.thanks the financial support from the Science and Technology Program of Guangzhou(Grant Nos.201906010016 and 2019050001);Guangdong Provincial Key Laboratory of Optical Information Materials and Technology(No.2017B030301007).

摘　　要：BiFeO_(3),a single-phase multiferroic material,possesses several polymorphs and exhibits a strong sensitivity to strain.Recently,emergent strain engineering in BiFeO_(3) thin films has attracted intense interest,which can overcome the confines of traditional strain engineering introduced through the mismatch between the film and substrate.In this review,we discuss emerging non-traditional strain engineering approaches to create new ground states and manipulate novel functionalities in multiferroic BiFeO_(3) thin films.Through fabricating freestanding thin films,inserting an interface layer or utilizing thermal expansion mismatch,continuously tunable strain can be imposed beyond substrate limitations.Nanostructured evolution and defect introduction are discussed as efficient routes to introduce strain,promising for the development of new nanodevices.Ultrafast optical excitation,growth conditions and chemical doping driven strain are summarized as well.We hope this review will arouse the readers’interest in this fascinating field.

关 键 词：BiFeO_(3) Freestanding thin films Interface layer Thermal expansion Defect engineering Ultrafast photoinduced strain 

分 类 号：O48[理学—固体物理]