等离子体结合六甲基二硅胺烷处理提升增透膜抗真空污染性能研究  

Plasma combined with hexamethyldisilazane treatment to improve anti-vacuum pollution performance of antireflective coatings

作　　者：董祥 吕海兵[2] 严鸿维[2] 黎波 向霞[1] 蒋晓东[2] Dong Xiang;LüHaibing;Yan Hongwei;Li Bo;Xiang Xia;Jiang Xiaodong(School of Physics,University of Electronic Science and Technology of China,Chengdu 610054,China;Laser Fusion Research Center,CAEP,P.O.Box 919-988,Mianyang 621900,China)

机构地区：[1]电子科技大学物理学院,成都610054 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2021年第7期4-9,共6页High Power Laser and Particle Beams

摘　　要：本文采用溶胶-凝胶法制备了SiO_(2)增透膜,然后对其进行等离子体结合六甲基二硅胺烷(HMDS)表面改性处理。研究了后处理改性对增透膜表面形貌、微观结构、光学性能及激光损伤性能的影响规律,获得了抗真空有机污染的二氧化硅增透膜。结果表明,增透膜在采用等离子体结合HMDS表面改性处理后,膜层收缩、粗糙度下降、极性羟基等有机基团含量减少;两步后处理改善了增透膜膜层结构和光学性能,显著提高了膜层疏水能力和真空条件下的抗污染性能,并且对溶胶-凝胶二氧化硅增透膜的高损伤阈值属性不产生影响。The SiO_(2) antireflective(AR)coating was prepared by sol-gel method and then modified by plasma combined with hexamethyldisilazane(HMDS).The effects of treatment on the surface morphology,microstructure,optical properties,and laser induced damage performance are investigated to obtain the SiO_(2) antireflective coating with good resistance to vacuum organic contaminants.The results show that the antireflection coating shrinks,the roughness decreases and the content of polar hydroxyl group decreases after plasma combined with HMDS surface modification.Plasma and HMDS surface treatment optimizes the structure and optical properties of the film.The hydrophobic capability of the film and the resistance performance to contaminants under vacuum conditions are significantly enhanced without bad effect on the high threshold of sol-gel silica antireflection coating.

关 键 词：SiO_(2)增透膜 等离子体处理 六甲基二硅胺烷 抗真空有机污染 

分 类 号：O484[理学—固体物理]