沉淀法制备纳米二氧化硅的工艺条件优化  

Optimization of Process Conditions for Preparation Nanosilicon Doxides by Precipitation Method

作　　者：杨长丕 赵利启 程米亮 易重庆 侯英杰 Yang Chang-pi;Zhao Li-qi;Cheng Mi-liang;Yi Chong-qing;Hou Ying-jie

机构地区：[1]湖南久日新材料有限公司,湖南怀化418200 [2]内蒙古久日新材料有限公司,内蒙古赤峰025250 [3]湖南恒光科技股份有限公司,湖南怀化418200 [4]河南昊华骏化集团有限公司,河南驻马店463000

出　　处：《化工设计通讯》2021年第7期69-69,81,共2页Chemical Engineering Design Communications

摘　　要：以硅酸钠、盐酸为原料,用十二烷基苯磺酸钠和司班混合表面活性剂为分散剂,制备了纳米二氧化硅。探讨了溶液pH、水加入量、司班加入量、十二烷基苯磺酸钠与司班的质量比、加热温度对纳米二氧化硅制备的影响。结果表明,制备纳米二氧化硅的最佳工艺条件为:硅酸钠加入量为10.00g,司班加入量为0.15g,十二烷基苯磺酸钠与司班的质量比为1∶1,水加入量为40mL,溶液pH为5.0,加热温度为30℃。对最佳工艺条件下制备的纳米二氧化硅,采用原子力显微镜扫描进行了粒径分析。Nano silica was prepared from sodium silicate and hydrochloric acid,with sodium dodecyl benzene sulfonate and Span mixed surfactant as dispersant.The effects of pH value of solution,the amount of water,the amount of Span,the mass ratio of sodium dodecyl benzene sulfonate to Span,and heating temperature on the preparation of nano-silica were discussed.The results showed that the optimum conditions for preparing nano silica were as follows:the addition amount of sodium silicate was 10.00g,the addition amount of Span was 0.15g,the mass ratio of sodium dodecyl benzene sulfonate and Span was 1∶1,the addition amount of water was 40mL,the pH value of the solution was 5.0,and the heating temperature was 30℃.The particle size of nano silica prepared under the optimum conditions was analyzed by atomic force microscope.

关 键 词：硅酸钠 盐酸 纳米二氧化硅 制备 原子力显微镜 

分 类 号：TQ127.2[化学工程—无机化工]