低能Xe离子辐照在Al表面上的光辐射研究  

Study of Optical Radiation from Low-energy Xe Ion Irradiation on Al Surface

作　　者：杨兆锐 徐秋梅[2] 耿一丹 郭义盼 戴振文[3] 赵红赟[2] 杨治虎[2] YANG Zhaorui;XU Qiumei;GENG Yidan;GUO Yipan;DAI Zhenwen;ZHAO Hongyun;YANG Zhihu(Gansu Provincical Hospital,Lanzhou 730000,China;Institute of Modern Physics,Chinese Academy of Sciences,Lanzhou 730000,China;College of Physics,Jilin University,Changchun 130012,China;College of Astronautics,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China)

机构地区：[1]甘肃省人民医院,甘肃兰州730000 [2]中国科学院近代物理研究所,甘肃兰州730000 [3]吉林大学物理学院,吉林长春130012 [4]南京航空航天大学航天学院,江苏南京210016

出　　处：《原子能科学技术》2021年第8期1353-1358,共6页Atomic Energy Science and Technology

基　　金：大科学装置科学研究联合基金(U1832114,U1732269);国家自然科学基金(11905105)。

摘　　要：本文测量了200~550 keV的Xe^(10+)离子轰击高纯度(99.99%)Al表面诱发的溅射Al原子的光发射,研究了AlⅠ308.10、309.14、394.52、396.28 nm光谱线强度比值和光子产额随入射离子能量的变化趋势。在本实验能量范围内,辐射光谱线强度比值随入射离子能量增加几乎不变,而发射谱线的光子产额随入射离子能量的增加呈现出不同趋势:入射离子能量为450 keV时,光子产额出现极大值,入射离子能量超过450 keV时,光子产额随能量的增加而减少,其变化趋势与核阻止本领随能量增加的变化没有出现类同的变化特征。结合核阻止和电子阻止效应对实验结果进行了讨论,结果表明:入射离子能量低于450 keV时,核阻止在碰撞中起主导作用,入射离子能量高于450 keV时,电子阻止在碰撞中起主导作用。Optical emission from sputtered Al atoms in the interaction of 200-550 keV Xe^(10+) ions with Al surface was measured,and spectral line intensity ratio of AlⅠ308.10,309.14,394.52 and 396.28 nm and photon yield were investigated as a function of the incident ion energy.There is little change for spectral line intensity ratio with the increasing collision ion energy,and the photon yield of the spectral line do not appear the same tendency with the increasing collision energy within the energy of the present experiment.At 450 keV,the photon yield presents a maximum,and the photon yield is reduced with the energy increase when the incident ion energy is more than 450 keV.Combined with the nuclear stopping and electronic stopping effect,it is shown that the nuclear stopping effect plays a leading role in the collision when the incident ion energy is less than 450 keV,and the electron stopping plays a leading role in the collision when the incident ion energy is more than 450 keV.

关 键 词：Xe离子 光发射 光子产额 溅射原子 

分 类 号：O571.33[理学—粒子物理与原子核物理]