In Situ Imaging of Layer-by-Layer Sublimation of Suspended Graphene  

作　　者：Jian Yu Huang Liang Qi Ju Li 

机构地区：[1]Center for Integrated Nanotechnologies(CINT),Sandia National Laboratories,Albuquerque,New Mexico 87185,USA [2]Department of Materials Science and Engineering,University of Pennsylvania,Philadelphia,Pennsylvania 19104,USA

出　　处：《Nano Research》2010年第1期43-50,共8页纳米研究（英文版）

基　　金：This work was performed,in part,at the Center for Integrated Nanotechnologies,the U.S.Department of Energy,Office of Basic Energy Sciences user facility.Sandia National Laboratories is a multi-program laboratory operated by Sandia Corporation,a Lockheed-Martin Company,for the U.S.Department of Energy under Contract No.DE-AC04-94AL85000;JL would like to acknowledge support by Honda Research Institute USA,NSF CMMI-0728069,AFOSR,and ONR N00014-05-1-0504;J.Y.H.would like to thank Dr.Ping Lu at Sandia National Laboratories for conducting the HRTEM image simulations.

摘　　要：An individual suspended graphene sheet was connected to a scanning tunneling microscopy probe inside a transmission electron microscope,and Joule heated to high temperatures.At high temperatures and under electron beam irradiation,the few-layer graphene sheets were removed layer-by-layer in the viewing area until a monolayer graphene was formed.The layer-by-layer peeling was initiated at vacancies in individual graphene layers.The vacancies expanded to form nanometer-sized holes,which then grew along the perimeter and propagated to both the top and bottom layers of a bilayer graphene joined by a bilayer edge.The layer-by-layer peeling was induced by atom sublimation caused by Joule heating and facilitated by atom displacement caused by high-energy electron irradiation,and may be harnessed to control the layer thickness of graphene for device applications.

关 键 词：GRAPHENE SUBLIMATION in situ electron microscopy vacancy hole bilayer edge 

分 类 号：O61[理学—无机化学]