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作 者:Yandong Wang Nan Lu Hongbo Xu Gang Shi Miaojun Xu Xiaowen Lin Haibo Li Wentao Wang Dianpeng Qi Yanqing Lu Lifeng Chi
机构地区:[1]State Key Laboratory of Supramolecular Structure and Materials,Jilin University,Changchun 130012,China [2]National Laboratory of Solid State Microstructures,Nanjing University,Nanjing 210093,China [3]Physikalisches Institut and Center for Nanotechnology(CeNTech),Westfälische Wilhelms-Universität,D-48149 Münster,Germany
出 处:《Nano Research》2010年第7期520-527,共8页纳米研究(英文版)
基 金:This work was supported by the National Natural Science Foundation of China(No.20373019);the Program for New Century Excellent Talents in University,and the National Basic Research Program(Nos.2007CB808003 and 2009CB939701).
摘 要:Corrugated silicon nanocone(SiNC)arrays have been fabricated on a silicon wafer by two polystyrene-sphere-monolayer-masked etching steps in order to create high-performance antireflective coatings.The reflectance was reduced from above 35%to less than 0.7%in the range 400-1050 nm,and it remained below 0.5%at incidence angles up to 70°at 632.8 nm for both s-and p-polarized light.The fluorinated corrugated SiNC array surface exhibits superhydrophobic properties with a water contact angle of 164°.
关 键 词:ANTIREFLECTION silicon nancone(SiNC)arrays reactive ion etching nanosphere lithography SUPERHYDROPHOBIC
分 类 号:TG1[金属学及工艺—金属学]
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