Solving the inverse grating problem by white light interference Fourier scatterometry  

作　　者：Valeriano Ferreras Paz Sandy Peterhansel Karsten Frenner Wolfgang Osten 

机构地区：[1]Institute of Applied Optics,Stuttgart University,70569 Stuttgart,Germany [2]SCoPE—Stuttgart Research Center of Photonic Engineering,Stuttgart University,Stuttgart,Germany

出　　处：《Light(Science & Applications)》2012年第1期17-23,共7页光（科学与应用)（英文版）

基　　金：We are thankful for the technical support given by Thomas Schoder.This work was supported by the German DFG-funded priority program(SPP1327)on‘Optically generated sub-100 nm structures for technical and bio-medical applications’within the subproject‘Development of a functional sub-100 nm 3D two-photon polymerization technique and optical characterization methods’and the DFG project‘Inverse-source and inverse-diffraction problems in photonics(OS111/32-1).’。

摘　　要：Scatterometry is a well-established,fast and precise optical metrology method used for the characterization of sub-lambda periodic features.The Fourier scatterometry method,by analyzing the Fourier plane,makes it possible to collect the angle-resolved diffraction spectrum without any mechanical scanning.To improve the depth sensitivity of this method,we combine it with white light interferometry.We show the exemplary application of the method on a silicon line grating.To characterize the sub-lambda features of the grating structures,we apply a model-based reconstruction approach by comparing simulated and measured spectra.All simulations are based on the rigorous coupled-wave analysis method.

关 键 词：Fourier scatterometry inverse problem optical sub-lambda metrology RCWA white light interference 

分 类 号：O17[理学—数学]