Silicon microcavity arrays with open access and a finesse of half a million  

作　　者：Georg Wachter Stefan Kuhn Stefan Minniberger Cameron Salter Peter Asenbaum James Millen Michael Schneider Johannes Schalko Ulrich Schmid Andre Felgner Dorothee Huser Markus Arndt Michael Trupke 

机构地区：[1]Faculty of Physics,University of Vienna,VCQ,Boltzmanngasse 5,1090 Vienna,Austria [2]Institute for Atomic and Subatomic Physics,TU Wien,VCQ,Stadionallee 2,1020 Vienna,Austria [3]Institute for Sensor and Actuator Systems,TU Wien,1040 Vienna,Austria [4]Physikalisch-Technische Bundesanstalt,Bundesallee 100,D-38116 Braunschweig,Germany [5]Department of Physics,King’s College London,Strand,London WC2R 2LS,UK

出　　处：《Light(Science & Applications)》2019年第1期862-868,共7页光（科学与应用)（英文版）

基　　金：the Austrian Science Fund(FWF)within project P-27297(CaviCool)and W1210-N25(COQUS),and I 3167-N27(SiC-EiC);the WWTF within the project ICT12-041(PhoCluDi);the TU Innovative Projekte for financial support;financial support from the Erwin Schrodinger Center for Quantum Science&Technology(ESQ)of the Austrian Academy of Sciences in the project ROTOQUOP.

摘　　要：Optical resonators are essential for fundamental science,applications in sensing and metrology,particle cooling,and quantum information processing.Cavities can significantly enhance interactions between light and matter.For many applications they perform this task best if the mode confinement is tight and the photon lifetime is long.Free access to the mode center is important in the design to admit atoms,molecules,nanoparticles,or solids into the light field.Here,we demonstrate how to machine microcavity arrays of extremely high quality in pristine silicon.Etched to an almost perfect parabolic shape with a surface roughness on the level of 2A and coated to a finesse exceeding F=500,000,these new devices can have lengths below 17μm,confining the photons to 5μm waists in a mode volume of 88λ^(3).Extending the cavity length to 150μm,on the order of the radius of curvature,in a symmetric mirror configuration yields a waist smaller than 7μm,with photon lifetimes exceeding 64 ns.Parallelized cleanroom fabrication delivers an entire microcavity array in a single process.Photolithographic precision furthermore yields alignment structures that result in mechanically robust,pre-aligned,symmetric microcavity arrays,representing a lightmatter interface with unprecedented performance.

关 键 词：process field. EXCEEDING 

分 类 号：O43[机械工程—光学工程]