Electron-beam lithography for polymer bioMEMS with submicron features  

作　　者：Kee Scholten Ellis Meng 

机构地区：[1]Department of Biomedical Engineering,University of Southern California,Los Angeles,CA 90089-1111,USA

出　　处：《Microsystems & Nanoengineering》2016年第1期45-51,共7页微系统与纳米工程（英文）

基　　金：funded by a Postdoctoral Scholar Research Grant from the Office of the Provost at USC.

摘　　要：We present a method for submicron fabrication of flexible,thin-film structures fully encapsulated in biocompatible polymer poly(chloro-p-xylylene)(Parylene C)that improves feature size and resolution by an order of magnitude compared with prior work.We achieved critical dimensions as small as 250 nm by adapting electron beam lithography for use on vapor deposited Parylene-coated substrates and fabricated encapsulated metal structures,including conducting traces,serpentine resistors,and nano-patterned electrodes.Structures were probed electrically and mechanically demonstrating robust performance even under flexion or torsion.The developed fabrication process for electron beam lithography on Parylene-coated substrates and characterization of the resulting structures are presented in addition to a discussion of the challenges of applying electron beam lithography to polymers.As an application of the technique,a Parylene-based neural probe prototype was fabricated with 32 recording sites patterned along a 2 mm long shank,an electrode density surpassing any prior polymer probe.

关 键 词：electron beam lithography flexible electronics parylene C polymer MEMS 

分 类 号：TB3[一般工业技术—材料科学与工程]