Scalable fabrication of microneedle arrays via spatially controlled UV exposure  

作　　者：Hidetoshi Takahashi Yun Jung Heo Nobuchika Arakawa Tesuo Kan Kiyoshi Matsumoto Ryuji Kawano Isao Shimoyama 

机构地区：[1]Department of Mechano-Informatics,Graduate School of Information Science and Technology,the University of Tokyo,7-3-1 Hongo,Bunkyo-ku,Tokyo 113-8656,Japan [2]Department of Mechanical Systems Engineering,Graduate School of Engineering,Tokyo University of Agriculture and Technology,2-24-16 Naka-cho,Koganei-shi,Tokyo 184-8588,Japan [3]Department of Mechanical Engineering and Intelligent Systems,Graduate School of Informatics and Engineering,the University of Electro-Communications,1-5-1 Chofugaoka,Chofu-shi,Tokyo 182-8585,Japan [4]IRT Research Initiative,the University of Tokyo,7-3-1 Hongo,Bunkyo-ku,Tokyo 113-8656,Japan [5]Department of Biotechnology and Life Science,Graduate School of Engineering,Tokyo University of Agriculture and Technology,2-24-16 Naka-cho,Koganei-shi,Tokyo 184-8588,Japan

出　　处：《Microsystems & Nanoengineering》2016年第1期73-81,共9页微系统与纳米工程（英文）

基　　金：This work was partially supported by Japan Science Technology Agency,Izumi Science and Technology Foundation,the Tateisi Science and Technology Foundation,and the Mazda Foundation

摘　　要：This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet(UV)lithography based on spatially controlled UV exposure doses.In comparison with other methods based on UV lithography,the present method can create microneedle structures with high scalability.When negative photoresist is exposed to inclined/rotated UV through circular mask patterns,a three-dimensional,needle-shaped distribution of the exposure dose forms in the irradiated region.Controlling the inclination angles and the exposure dose modifies the photo-polymerized portion of the photoresist,thus allowing the variation of the heights and contours of microneedles formed by using the same mask patterns.In an experimental study,the dimensions of the fabricated needles agreed well with the theoretical predictions for varying inclination angles and exposure doses.These results demonstrate that our theoretical approach can provide a simple route for fabricating microneedles with on-demand geometry.The fabricated microneedles can be used as solid microneedles or as a mold master for dissolving microneedles,thus simplifying the microneedle fabrication process.We envision that this method can improve fabrication accuracy and reduce fabrication cost and time,thereby facilitating the practical applications of microneedle-based drug delivery technology.

关 键 词：inclined/rotated lithography microneedle array UV exposure ratio 

分 类 号：TN3[电子电信—物理电子学]