Reflectivity of W/Si Multilayer at the Photo-energies of 700eV and 1200eV  

作　　者：FENG Shi-Meng ZHU Guo-Long SHAO Jian-Da YI Kui FAN Zheng-Xiu 冯仕猛;祝国龙;邵建达;易葵;范正修(Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,P.O.Box 800-211,Shanghai 201800)

机构地区：[1]Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,P.O.Box 800-211,Shanghai 201800

出　　处：《Chinese Physics Letters》2001年第11期1481-1482,共2页中国物理快报（英文版）

摘　　要：We have deposited W/Si multilayer mirrors using magnetron sputtering, and measured their reflectivity at the Beijing Synchrotron Radiation Facility. The W/Si multilayer mirrors show a peak reflectivity of approximately 10% at a photo-energy of 1200eV and 10.5% at a photo-energy of 700eV at an incidence angle of 81°. So far, no higher reflectivity than that given in this letter has been reported.

关 键 词：REFLECTIVITY MULTILAYER LETTER 

分 类 号：O48[理学—固体物理]