Superconducting MgB_(2) Thin Films with Tc ≈ 39 K Grown by Pulsed Laser Deposition  

作　　者：WANG Shu-Fang DAI Shou-Yu ZHOU Yue-Liang CHEN Zheng-Hao CUI Da-Fu XU Jia-Di HE Meng LÜHui-Bin YANG Guo-Zhen 王淑芳;戴守愚;周岳亮;陈正豪;崔大复;许佳迪;何萌;吕惠宾;杨国桢(Laboratory of Optical Physics,Institute of Physics and Center for Condensed Matter Physics,Chinese Academy of Sciences,Beijing 100080)

机构地区：[1]Laboratory of Optical Physics,Institute of Physics and Center for Condensed Mater Physcis,Chinese Academy of Sciences,Beijing 100080

出　　处：《Chinese Physics Letters》2001年第7期967-968,共2页中国物理快报（英文版）

基　　金：Supported by a grant from the State Kay Program of China and the National Natural Science Foundation of China.

摘　　要：Superconducting MgB_(2) thin films were fabricated on Al_(2)O_(3)(0001)substrates under an ex situ processing conditions.Boron thin films were deposited by pulsed laser deposition followed by a post-annealing process.Resistance measurements of the deposited MgB_(2) films show Tc of~39 K,while scanning electron microscopy and x-ray diffraction analysis indicate that the films consist of well-crystallized grains with a highly c-axis-oriented structure.

关 键 词：structure. conditions. process. 

分 类 号：O48[理学—固体物理]