Laser-Focused Atomic Deposition for Nanascale Grating  

作　　者：MA Yan LI Tong-Bao WU Wen XIAO Yi-Li ZHANG Ping-Ping GONG Wei-Gang 马艳;李同保;巫文;肖伊立;张萍萍;龚卫刚(Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Department of Physics,Tongji University,Shanghai 200092)

机构地区：[1]Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Department of Physics,Tongji University,Shanghai 200092

出　　处：《Chinese Physics Letters》2011年第7期97-99,共3页中国物理快报（英文版）

基　　金：by the Shanghai Nanoscience Foundation(0852nm07000,0952nm07000);the National Natural Science Foundation of China(10804084);the National Key Technology R&D Program(2006BAF06B08).

摘　　要：Laser-focused atomic deposition is a technique with which nearly resonant light is used to pattern an atom beam.To solve the problem that the result of laser-cooled atoms cannot be monitored during the 30-min depositing time,we present a three-hole mechanically precollimated aperture apparatus.A 425 nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the nanoscale grating.The period of the grating is 213±0.1 nm,the height is 4 nm and the full width at half miximum is 64±6 nm.

关 键 词：FOCUS CHROMIUM apparatus 

分 类 号：TN2[电子电信—物理电子学]