A Special Sampling Structure with an Arbitrary Equivalent-Phase-Shift for Semiconductor Lasers and Multiwavelength Laser Arrays  

作　　者：ZHOU Ya-Ting SHI Yue-Chun LI Si-Min LIU Sheng-Chun CHEN Xiang-Fei 周亚亭;施跃春;李思敏;刘盛春;陈向飞(Microwave-Photonics Technology Laboratory,Nanjing National Laboratory of Microstructures,School of Engineering and Applied Sciences,Nanjing University,Nanjing 210093;Changzhou Institute of Technology,Changzhou 213002)

机构地区：[1]Microwave-Photonics Technology Laboratory,Nanjing National Laboratory of Microstructures,School of Engineering and Applied Sciences,Nanjing University,Nanjing 210093 [2]Changzhou Institute of Technology,Changzhou 213002

出　　处：《Chinese Physics Letters》2011年第7期140-143,共4页中国物理快报（英文版）

基　　金：the National Natural Science Foundation of China under Grant No 60877043;the Natural Science Foundation of Changzhou Institute of Technology under Grant No YN1008;the New Century Excellent Talents in University.

摘　　要：A method used to introduce an arbitrary equivalent-phase-shift(EPS)into an asymmetric sampled Bragg grating(SBG)is reported.Under the same structural parameters except for the sampling pattern,the asymmetric SBG offers better performance than that of a normal SBG structure for keeping single-longitudinal-mode(SLM)operation.This is because the proposed sampling pattern can suppress the 0th-order light resonance due to the mismatch between the two different grating sections along the whole SBG.This method can be used to design and fabricate semiconductor lasers and multiwavelength laser arrays(MLAs)with the required EPS at high yield and low cost.

关 键 词：asymmetric pattern SHIFT 

分 类 号：TN2[电子电信—物理电子学]