Ultrathin Carbon Films Prepared by Negative Cluster-Beam Technology  

作　　者：ZHANG Zao-Di WANG Ze-Song WANG Shi-Xu FU De-Jun 张早娣;王泽松;王世旭;付德君(Accelerator Laboratory,School of Physics and Technology and Key Laboratory of Artificial Micro-and Nano-Materials of Ministry of Education of China,Wuhan University,Wuhan 430072)

机构地区：[1]Accelerator Laboratory,School of Physics and Technology and Key Laboratory of Artificial Micro-and Nano-Materials of Ministry of Education of China,Wuhan University,Wuhan 430072

出　　处：《Chinese Physics Letters》2012年第7期265-267,共3页中国物理快报（英文版）

基　　金：Supported by the International Cooperation Program of the Ministry of Science and Technology of China under Grant No 2010DFA02010;the National Natural Science Foundation of China under Grant No 11105100.

摘　　要：We develop a miniaturized chamber installed on a tandetron accelerator into which negative ions of small carbon clusters are transported.Negative clusters C-1-C-10 are obtained with beam currents of 1-104 nA at energies of l0-20keV.C-2 beams of 0.2μA are used to directly deposit carbon films on SiO_(2)/Si substrates.Formation of ultrathin carbon films are demonstrated by Raman scattering,which reveals the evolution of the graphitic peak (1550cm-2) with deposition time.

关 键 词：CARBON SCATTERING CARBON 

分 类 号：TB3[一般工业技术—材料科学与工程]