Discretely-supported nanoimprint lithography for patterning the high-spatial-frequency stepped surface  

作　　者：Chunhui Wang Yu Fan Jinyou Shao Zhengjie Yang Jiaxing Sun Hongmiao Tian Xiangming Li 

机构地区：[1]Micro-and Nano-technology Research Center,State Key Laboratory for Manufacturing Systems Engineering Xi’an Jiaotong University,Xi’an 710049,China

出　　处：《Nano Research》2021年第8期2606-2612,共7页纳米研究（英文版）

基　　金：financed by the National Key R&D Program of China(No.2017YFB1102900);the Natural Science Foundation of China(No.51805422);the China Postdoctoral Science Foundation(No.2019M653592);the Basic Research Program of Natural Science of Shaanxi Province of China(No.2019JLM-5).

摘　　要：Non-planar morphology is a common feature of devices applied in various physical fields,such as light or fluid,which pose a great challenge for surface nano-patterning to improve their performance.The present study proposes a discretely-supported nanoimprint.lithography(NIL)technique to fabricate nanostructures on the extremely non-planar surface,namely high-spatial-frequency stepped surface.The designed discretely imprinting template implanted a discretely-supported intermediate buffer layer made of sparse pillars arrays.This allowed the simultaneous generation of air-cushion-like buffer and reliable support to the thin structured layer in the template.The resulting low bending stiffness and distributed concentrated load of the template jointly overcome the contact difficulty with a stepped surface,and enable the template to encase the stepped protrusion as tight as possible.Based on the proposed discretely-supported NIL,nanostructures were fabricated on the luminous interface of light emitting diodes chips that covered with micrometer step electrodes pad.About 96%of the utilized indium tin oxide transparent current spreading layer surface on top of the light emitting diode(LED)chips was coated with nanoholes array,with an increase by more than 40%in the optical output power.The excellent ability of nanopatterning a non-planar substrate could potentially lead innovate design and development of high performance device based on discretely-supported NIL.

关 键 词：nanoimprint lithography non-planar surface discretely-supported template NANOPATTERNING semiconductor light emitting devices 

分 类 号：TB383[一般工业技术—材料科学与工程]