拓扑绝缘体薄膜在超快光器件中的应用(特邀)  

Applications of Thin-film Topological Insulators in Ultrafast Optical Devices(Invited)

作　　者：廖琨 李辰童 胡小永[1] 龚旗煌[1] LIAO Kun;LI Chentong;HU Xiaoyong;GONG Qihuang(State Key Laboratory for Mesoscopic Physics,Department of Physics,Peking University,Beijing 100871,China)

机构地区：[1]北京大学物理学院人工微结构和介观物理国家重点实验室,北京100871

出　　处：《光子学报》2021年第8期145-165,共21页Acta Photonica Sinica

基　　金：国家重点研究开发项目(Nos.2018YFB2200403,2018YFA0704404);国家自然科学基金(Nos.61775003,11734001,91950204,11527901);北京市科技计划课题(No.Z191100007219001)。

摘　　要：随着超快光学的发展和对以Bi2Te3为代表的拓扑绝缘体材料研究的深入,近几年,将拓扑绝缘体薄膜应用于超快光器件的研究方向发展迅速并发表了一系列研究成果,本文综述了近年来基于拓扑绝缘体材料的超快激光及光器件的研究。从材料结构及制备方法出发,介绍了其独特的光学及光电特性,总结了其在超快激光及光器件中的应用研究进展,回顾和讨论了这一领域的成就和挑战,并对将拓扑绝缘体薄膜材料应用于超快光器件的进一步研究进行了展望。With the development of ultrafast optics and the in-depth research on topological insulator materials represented by Bi2Te3,the research on applying topological insulator thin films to ultrafast lasers and devices has developed rapidly,and a series of research results have been published in recent years.This paper reviews the research on ultrafast lasers and devices based on topological insulator materials by starting from structure characteristics and preparation methods,introducing their unique optical and optoelectronic properties,summarizing the research on their applications in ultrafast lasers and optical devices,as well as reviewing and discussing the achievements and challenges in this field.We also provide an outlook on further development directions on the application of topological insulator thin film materials in ultrafast optics.

关 键 词：拓扑绝缘体材料 Bi2Te3薄膜 宽频强非线性效应 饱和吸收体 超快光器件 

分 类 号：O436[机械工程—光学工程]