Nanoimprint lithography for high-throughput fabrication of metasurfaces  

作　　者：Dong Kyo OH Taejun LEE Byoungsu KO Trevon BADLOE Jong G.OK Junsuk RHO 

机构地区：[1]Department of Mechanical Engineering,Pohang University of Science and Technology(POSTECH),Pohang 37673.Republic of Korea [2]Department of Mechanical and Automotive Engineering,Seoul National University of Science and Technology(SEOULTECH),Seoul 01811,Republic of Korea [3]Department of Chemical Engineering,Pohang University of Science and Technology(POSTECH),Pohang 37673,Republic of Korea

出　　处：《Frontiers of Optoelectronics》2021年第2期229-251,共23页光电子前沿（英文版）

基　　金：the National Research Foundation(NRP)grant(NRF-2019R1A2C3003129)flinded by the Ministry of Science and ICT,Republic of Korea.T.L.acknowledges the NRF Global Ph.D.fellowship(NRF-2019H1 A2A 1076295)funded by the Ministry of Education,Republic of Korea.

摘　　要：Metasurfaces are composed of periodic subwavelength nanostructures and exhibit optical properties that are not found in nature.They have been widely investigated for optical applications such as holograms,wavefront shaping,and structural color printing,however,electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low productivity.Although alternative optical technologies,such as holographic lithography and plasmonic lithography,can overcome these drawbacks,such methods are still constrained by the optical diffraction limit.To break through this fundamental problem,mechanical nanopatteming processes have been actively studied in many fields,with nanoimprint lithography(NIL)coming to the forefront.Since NIL replicates the nanopattem of the mold regardless of the diffraction limit,NIL can achieve sufficiently high productivity and patterning resolution,giving rise to an explosive development in the fabrication of metasurfaces.In this review,we focus on various NIL technologies for the manufacturing of metasurfaces.First,we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of metasurfaces.We also discuss recent applications of NIL in the realization of metasurfaces.Finally,we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces.

关 键 词：NANOIMPRINT scalable fabrication large-area metasurface tailored nanostructure hierarchical nanostructures 

分 类 号：O43[机械工程—光学工程]