Zr_(55)Al_(10)Ni_(5)Cu_(30)amorphous alloy film prepared by magnetron sputtering method  

作　　者：Dong-Mei Mi Sheng-Li Zhu Yan-Qin Liang Zhao-Yang Li Zhen-Duo Cui Xian-Jin Yang Akihisa Inoue 

机构地区：[1]School of Materials Science and Engineering,Tianjin University,Tianjin,300072,China [2]Tianjin Key Laboratory of Composite and Functional Materials,Tianjin,300072,China [3]Key Laboratory of Advanced Ceramics and Machining Technology,Ministry of Education,Tianjin,300072,China [4]Department of Physics,Kings Abudulaziz University,Jeddah,22254,Saudi Arabia

出　　处：《Rare Metals》2021年第8期2237-2243,共7页稀有金属（英文版）

基　　金：financially supported by the National Natural Science Foundation of China(No.51771131)。

摘　　要：In this work,amorphous Zr_(55)Al_(10)Ni_(5)Cu_(30)alloy thin film was prepared on D36 steel substrate by magnetron sputtering method.The film was characterized by scanning electron microscopy(SEM),X-ray diffraction(XRD),atomic force microscopy(AFM),hardness tester and nano indentation.Corrosion behavior of the film was investigated in 3.5%NaCl aqueous solutions by an electrochemical method.At room temperature,the amorphous alloy film was formed completely after sputtering for 5 h.The surface morphology of the amorphous alloy film was uniform and smooth.Formation of the amorphous alloy film improved the microhardness and corrosion resistance of the D36 substrate.The amorphous alloy film(prepared at room temperature for 5 h)exhibited good adhesion strength with the substrate.The as-sputtered sample exhibited a crevice corrosion trend when the sputtering time was too short(1 h)or too long(10 h).

关 键 词：Magnetron sputtering Amorphous alloy Thin film Corrosion resistance Zr_(55)Al_(10)Ni_(5)Cu_(30) 

分 类 号：TG174.4[金属学及工艺—金属表面处理]