热压法制备二硫化钼陶瓷靶材工艺研究  

Preparation of Molybdenum Disulfide Ceramic Target with Hot-pressing

作　　者：崔玉青[1] 李晶[1] 席莎[1] 王娜[1] 武洲[1] 朱琦[1] 安耿[1] CUI Yuqing;LI Jing;XI Sha;WANG Na;WU Zhou;ZHU Qi;AN Geng(Jinduicheng Molybdenum Co.,Ltd.,Xi’an 710077,Shaanxi,China)

机构地区：[1]金堆城钼业股份有限公司技术中心,陕西西安710077

出　　处：《陶瓷学报》2021年第4期614-619,共6页Journal of Ceramics

基　　金：国家重点研发计划(2017YFB0305404)。

摘　　要：采用热压工艺,制备了相对密度较高的二硫化钼陶瓷靶材产品。以靶材的相对密度为考察指标,研究了热压温度、压强、时间、烧结气氛、原料形态对二硫化钼陶瓷靶材相对密度的影响。通过阿基米德法、XRD、SEM及能谱等检测手段对热压陶瓷靶材的相对密度、成分、微观形貌进行表征分析。其中,热压温度、压强和时间是影响靶材相对密度的三个主要因素。以二硫化钼粉为原料,在真空环境下,当热压温度为1100℃,压强为36 MPa,热压时间为1.5 h时,二硫化钼靶材相对密度可达98.5%,达到靶材溅射要求。为进一步提升靶材致密度,以二硫化钼粉和坯料为原料,在常压密闭的Ar气气氛下,当热压温度提升至1150℃时,靶材相对密度可分别升至99.1%和99.8%。最后,对不同相对密度靶材断口的形貌进行对比分析。Hot pressing technology was used to prepare molybdenum disulfide target with high density.The effects of sintering temperature,pressure,time,sintering atmosphere and raw materials were studied.Relative density,composition and microstructure of the target were characterized by using Archimedes method,XRD,SEM and EDS.Temperature,pressure and time were the main factors affecting the relative density of the target.It was showed that molybdenum disulfide target with a relative density of 98.5%could be obtained at 1100℃at 36 MPa in 1.5 h in vacuum,with molybdenum disulfide powder,which meets the requirements as sputtering target.In order to further increase the density,Ar was introduced into the system at atmospheric pressure.As the hot pressing temperature was raised to 1150℃,the relative density could reach 99.1%and 99.8%,with powder and blank,respectively.Finally,fracture surfaces of the samples with different densities were characterized by using SEM.

关 键 词：二硫化钼 靶材 热压烧结法 致密化 

分 类 号：TQ174.75[化学工程—陶瓷工业]