高精度镍微柱阵列模具的制造  

Manufacturing of High-Precision Nickel Micro-Pillar Array Mold

作　　者：杜立群[1,2] 王胜羿 肖海涛 于洋[2] 董雅坤 叶作彦 王超[3] Du Liqun;Wang Shengyi;Xiao Haitao;Yu Yang;Dong Yakun;Ye Zuoyan;Wang Chao(Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education,Dalian University of Technology,Dalian,Liaoning 116024,CHN;Key Laboratory for Micro/Nano Technology and System of Liaoning Province,Dalian University of Technology,Dalian,Liaoning 116024,CHN;Institute of Mechanical Manufacturing Technology,China Academy of Engineering Physics,Mianyang,Sichuan 116024,CHN)

机构地区：[1]大连理工大学精密与特种加工教育部重点实验室,辽宁大连116024 [2]大连理工大学辽宁省微纳米及系统重点实验室,辽宁大连116024 [3]中国工程物理研究院机械制造工艺研究所,四川绵阳621900

出　　处：《模具制造》2021年第9期67-70,共4页Die & Mould Manufacture

基　　金：国家自然科学基金资助项目(51975103)。

摘　　要：使用基于SU-8胶的微电铸工艺制造了一款微柱宽度为200μm,高度为300μm,柱间隙最小为200μm的镍微柱阵列模具。针对制造过程中SU-8光刻胶去胶难的问题,提出了一种预置溶胀间隙的方法。该方法可以使完整的胶膜分割成许多独立单元,独立的胶膜单元在去胶时溶胀破裂,脱离金属微结构。去胶释放后微柱结构表面光洁、无残余光刻胶,微柱阵列的宽度尺寸误差低至1.35%。研究表明:预置溶胀间隙的方法具有易操作、成本低等优点,可以应用于微小结构的去胶。A nickel micro-pillar array with the width of 200μm,the height of 300μm,and the minimum column gap of 200μm was fabricated by using the micro-electroforming process based on SU-8 photoresist.Aiming at the difficulty of removing SU-8 photoresist during the manufacturing process.This paper proposes a method of presetting the swelling gap,in this method,the complete photoresist film is divided into many independent units.The independent film units are swelled and broken during degumming and break away from the metal microstructure.After the photoresist is removed,the surface of the micro-pillar structure is smooth and has no residual photoresist.The relative error of width is as low as 1.35%.The research shows that the preset swelling gap has the advantages of easy operation and low cost,which is an effective method for removing photoresist from small structures.

关 键 词：镍微柱阵列 SU-8胶去胶 结合力 溶胀 

分 类 号：TG659[金属学及工艺—金属切削加工及机床]