暴露(002)晶面的WO_(3)纳米片薄膜的光电催化性能  

Study on Photoelectric Catalysis Performance of WO_(3) Nanoplate Films with Exposed(002)Facets

作　　者：郭晨鹏 李晶晶 李丽华[1] 顾永军[1] 黄金亮[1] GUO Chenpeng;LI Jingjing;LI Lihua;GU Yongjun;HUANG Jinliang(School of Materials Science and Engineering,Henan University of Science and Technology,Luoyang 471023,CHN)

机构地区：[1]河南科技大学材料科学与工程学院,河南洛阳471023

出　　处：《半导体光电》2021年第4期532-535,541,共5页Semiconductor Optoelectronics

摘　　要：采用一步水热法,以钨酸钠(Na2WO_(4)·2H_(2)O)为原料,草酸(H_(2)C2O_(4))为结构导向剂,在FTO衬底上制备了具有高活性(002)面的WO_(3)纳米片薄膜。利用XRD,FESEM对薄膜的物相和形貌进行了分析,通过UV-Vis,PL对薄膜的能带结构和载流子的分离能力进行了表征,通过电化学工作站对WO_(3)薄膜的光电性能进行了研究。分析了草酸用量对WO_(3)纳米片薄膜的晶体取向、形貌尺寸和光电催化性能的影响。结果表明:草酸用量为0.30g时,WO_(3)纳米片薄膜的(002)面衍射峰强度最高,具有良好的光电催化性能。WO_(3) nanoplate films with highly active(002)facets were prepared on the FTOsubstrate with one-step hydrothermal method by using sodium tungstate dihydrate(Na2WO_(4)·2H_(2)O)as the raw material and oxalic acid(H_(2)C2O_(4))as the structure-directing agent.The phase and morphology of the samples were characterized by XRD and FESEM.The energy band structure and carrier separation ability of the film were characterized by UV-Vis and PL.The photoelectric properties of WO_(3)nanoplate films were characterized by electrochemical workstation.The effects of oxalic acid dosages on the crystal orientation,morphology,size and photocatalytic performance of WO_(3) nanoplate films were investigated.The results show that the WO_(3) nanoplate films with 0.3g oxalic acid dosages present the highest diffraction peak on the(002)facets and possess the best photocatalytic performance.

关 键 词：WO_(3)纳米片薄膜 一步水热法 草酸 光电催化 

分 类 号：TB383.2[一般工业技术—材料科学与工程]