低气压直流放电金属铜等离子体  

Low-pressure copper vapor plasma induced by direct current supply

作　　者：闫东潇 李占贤 崔亚硕 于江涛 YAN Dong-xiao;LI Zhan-xian;CUI Ya-shuo;YU Jiang-tao(College of Mechanical Engineering,North China University of Science and Technology,Tangshan 063210;College of Mechanical Engineering,Yanshan University,Qinhuangdao 066000)

机构地区：[1]华北理工大学机械工程学院,唐山063210 [2]燕山大学机械工程学院,秦皇岛066000

出　　处：《核聚变与等离子体物理》2021年第3期280-283,共4页Nuclear Fusion and Plasma Physics

摘　　要：在原子蒸气激光同位素分离技术中用直流电源实现原子化和激发电离过程,低气压下使用焊锡短路阴、阳极得到了金属铜等离子体稳定射流。在气压10^(-3)Pa、功率0.9kW下,测得稳定放电的伏安特性曲线和光谱强度图。通过计算得到电子密度在10^(9)cm^(-3)左右、电子温度在0.69eV左右。The atomization and excitation ionization processes in atomic vapor laser isotope separation technology are realized by direct current supply and copper plasma stabilized jet is obtained by using solder short circuit cathode and anode under low pressure.Under the pressure of 10^(-3)Pa and power of 0.9kW,the volt-ampere characteristic curve and spectral intensity diagram of stable discharge were measured.It was obtained that the electron density was about 10^(9) cm^(-3) and the electron temperature was about 0.69eV.

关 键 词：直流放电 铜蒸气等离子体 伏安特性曲线 光谱图 

分 类 号：O539[理学—等离子体物理]