分子层沉积纳米薄膜的现状和发展  

Present Situation and Development of Nano Films Deposited by Molecular Layer Deposition

作　　者：陈谦 杨丽珍[1] 刘忠伟[1] 张海宝[1] 陈强[1] CHEN QIAN;YANG Li-zhen;LIU Zhong-Wei;ZHANG Hai-bao;CHEN Qiang(Laboratory of Plasma Physics and Materials,Beijing Institute of Graphic Communication,Beijing 102600,China)

机构地区：[1]北京印刷学院等离子体物理及材料研究室,北京102600

出　　处：《真空》2021年第5期26-31,共6页Vacuum

摘　　要：随着微电子技术、锂离子电池和太阳能电池等行业的发展,人们对聚合物薄膜,尤其是纳米级聚合物薄膜的要求也越来越高。在传统的沉积方法不能满足要求的条件下,找到新的沉积聚合物的方法势在必行。分子层沉积(MLD)是一种类似于原子层沉积的技术,它可以精确控制聚合物膜的厚度、组成、形貌和保形性。因此,MLD可以成为制备聚合物薄膜的一种新方法。本文综述了分子层沉积的原理和方法,以及在薄膜领域的发展和应用,最后给出了分子层沉积技术未来发展所面对的挑战和展望。With the development of microelectronic technology,lithium-ion batteries and solar cells,especially the need of nano polymer films,are becoming higher and higher.Since the traditional deposition method can not meet the requirements,it is imperative to find a new method to deposit polymer.Molecular layer deposition(MLD)is a technique similar to atomic layer deposition,which can precisely control the thickness,composition,morphology and shape retention of polymer films.Therefore,MLD can be a new method to prepare polymer films.In this paper,the principle and method of MLD,as well as the development and application in the field of thin film preparation are reviewed.Finally,the challenges and prospects of MLD in the future are forecasted.

关 键 词：分子层沉积技术 原理 薄膜 应用 

分 类 号：TQ31[化学工程—高聚物工业] TB43[一般工业技术]