硅酸及其盐的研究(ⅪⅩ)--CNDO/2法研究单-、双-和三硅酸的酸强度  

Studies on Silicic Acid and Its Salts(ⅩⅨ)--The Study of Acid Strength of Mono-,Di-,and Tri-Silicic Acids by CNDO/2 Method

作　　者：王国雄[1] 毛延[1] 陈荣三[1] 戴安邦[1] Wang Guoxiong;Mao Yan;Chen Rongsan;Dai Anbang(Coordination Chemistry Institute,Nanjin9 University,Nanjing)

机构地区：[1]南京大学配位化学研究所

出　　处：《高等学校化学学报》1987年第2期103-108,共6页Chemical Journal of Chinese Universities

摘　　要：本文用CNDO/2的量化计算方法估计了单硅酸、双硅酸和三硅酸分子中氢氧键的强度,并以此解释实验发现的这几种硅酸溶液的酸强度:单硅酸>双硅酸<三硅酸。The strength of O-Hbond in silicic acid from monomer to trimer has been investigated by using CNDO/2 method.The computed values give a reasonable explanation for the experimentally measured acid strength which is found to be.monomer>dimer<trimer.

关 键 词：CNDO/2 酸强度 单硅酸 硅酸溶液 氢氧键 

分 类 号：TQ1[化学工程]