离子束溅射沉积Sm-Fe系薄膜的沉积速率计算  

Calculation of Deposition Rate of Sm-Fe Thin Films by Ion Beam Sputtering Deposition

作　　者：刘凯 LIU Kai(Longyan Branch of Fujian Boiler and Pressure Vessel Inspection Institute,Longyan 364000,Fujian,China)

机构地区：[1]福建省锅炉压力容器检验研究院龙岩分院,福建龙岩364000

出　　处：《质量技术监督研究》2021年第5期16-19,共4页Quality and Technical Supervision Research

摘　　要：文中首先介绍如何用离子束溅射沉积法(IBSD)在铍青铜基片上制备Sm-Fe/Fe多层膜,详细描述镀膜方案和镀膜过程。其次,利用推导出的公式计算得出薄膜的理论沉积速率,并与称重法测得的薄膜实际沉积速率进行对比。最后,分析理论计算值与实际测量值产生偏差的原因,并提出修正建议,以期进一步提高薄膜沉积速率的计算精度,对精确控制Sm-Fe/Fe多层膜的制备有一定指导意义。Firstly,this paper introduces how to prepare Sm-Fe/Fe multilayer films on beryllium bronze substrate by ion beam sputtering deposition(IBSD),with the coating scheme and process described in detail.Secondly,the theoretical deposition rate was calculated by the formula,and compared with the actual deposition rate measured by weighing method.Finally,this paper analyzes the reasons for the deviation between the theoretical calculated value and the actual measured value,and puts forward the amendment suggestions,in order to further improve the calculation accuracy of film deposition rate.It has a certain guiding significance for accurately controlling the preparation of Sm-Fe/Fe multilayer films.

关 键 词：Sm-Fe/Fe多层膜 沉积速率 

分 类 号：TG174.4[金属学及工艺—金属表面处理]