氢还原氢氟酸刻蚀的TiO_(2)纳米薄膜光电化学性能  

Photoelectrochemical Properties of Hydrogen Reduced TiO_(2) Film by HF Corrosion

作　　者：于濂清 杨钱龙 朱海丰 段丽杰 赵兴雨 王艳坤 YU Lianqing;YANG Qianlong;ZHU Haifeng;DUAN Lijie;ZHAO Xingyu;WANG Yankun(College of Material Science and Engineering,China University of Petroleum(East China),Qingdao 266580,China;College of Science,China University of Petroleum(East China),Qingdao 266580,China)

机构地区：[1]中国石油大学(华东)材料科学与工程学院,青岛266580 [2]中国石油大学(华东)理学院,青岛266580

出　　处：《材料导报》2021年第20期20001-20004,共4页Materials Reports

基　　金：山东省自然科学基金(ZR2020ME010)。

摘　　要：TiO_(2)是一种价格低廉、稳定的半导体材料,被广泛应用于光催化水裂解、污水处理等众多领域,但其只能吸收高能量的紫外光,限制了实际应用。本工作采用氢氟酸溶液刻蚀纯钛片,然后在一系列温度下对其进行热处理,使其表面与氧气反应生成TiO_(2)薄膜,随后将样品置于氢气气氛下进行还原处理。通过XRD对其进行物相表征,SEM观察微观形貌,利用电化学工作站测试样品的光响应曲线、线性扫描伏安曲线以及电化学阻抗谱,并根据线性扫描伏安曲线计算出样品的光转换效率。结果表明,经过HF处理后,所形成的TiO_(2)纳米薄膜暴露(101)晶面。同时,经过HF处理和氢气还原制备的样品的光电性能有了较大提升,光电流密度最高可达1.04 mA/cm^(2),是未经HF处理和氢气还原薄膜的11.5倍,是仅经HF处理薄膜的2.97倍,最大光转换效率提升了70%。该方法制备的纳米薄膜材料在光催化降解、产氢等领域具有潜在的应用价值。TiO_(2)is a low cost and stable semiconductor.It is widely studied in photocatalytic water splitting,waste-water treatment and so on.However,it can only absorb ultraviolet light limiting its practical application.HF solution was used to etch titanium sheet.Afterwards,TiO_(2)nano-film were reduced in H_(2)atmosphere under high temperature.The TiO_(2)nano-film were tested by XRD,SEM and electrochemical workstation to obtain phase composition,microstructures and photo-response current,linear sweep voltammetry curve,electrochemical impedance spectra,respectively.The results show that TiO_(2)nano-film exposes more rutile(101)facet through HF treatment.And the photoelectrochemical properties apparently promote after H_(2)treatment,the photocurrent density is up to 1.04 mA/cm^(2).It is 11.5 times higher than that of pure nano-film,and 2.97 times higher than that of without H_(2)reduction.Meanwhile,the maximum photoconversion efficiency reached 70%improvement.

关 键 词：二氧化钛 氢氟酸处理 氢气还原 光电化学性能 

分 类 号：O643.36[理学—物理化学] O644.1[理学—化学]