检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:Jun LI Xingui TANG Qiuxiang LIU Yanping JIANG Zhenxun TANG
出 处:《Journal of Advanced Ceramics》2021年第5期1001-1010,共10页先进陶瓷(英文)
基 金:supported by the National Natural Science Foundation of China(Grant No.11574057);the Guangdong Basic and Applied Basic Research Foundation(Grant No.2021A1515012607);the Science and Technology Program of Guangdong Province of China(Grant No.2017A010104022).
摘 要:The polycrystalline strontium ferrate titanate(SrFe_(0.1)Ti_(0.9)O_(3),SFTO)thin films have been successfully prepared by chemical solution method.By analyzing the current-voltage(I-V)characteristics,we discuss the conduction mechanism of SFTO.It is found that the number of oxygen vacancy defects is increased by Fe ion doping,making SFTO be with better resistive switching property.Fe ion doping can also enhance the absorption of strontium titanate to be exposed to visible light,which is associated with the change of energy band.The band gap width(2.84 eV)of SFTO films is figured out,which is less than that of pure strontium titanate.Due to more oxygen vacancy defects caused by Fe ion doping,the band gap width of strontium titanate was reduced slightly.The defect types of SFTO thin films can be determined by electron paramagnetic resonance spectroscopy.In addition,we analyzed the energy band and state density of SFTO by first-principles calculation based on density functional theory,and found that Fe ion doping can reduce the band gap width of strontium titanate with micro-regulation on the band structure.A chemical state of SFTO was analyzed by X-ray photo electron spectroscopy.At the same time,the structure and morphology of SFTO were characterized by X-ray diffraction and scanning electron microscope.This study deepens further understanding of the influence of Fe ion doping on the structure and properties of strontium ferrate titanate,which is expected to be a functional thin film material for memristor devices.
关 键 词:SrTiO_(3) thin films resistive switching oxygen vacancy first principles
分 类 号:TB383.2[一般工业技术—材料科学与工程]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.185