用于全固态355 nm紫外激光器的三波长高反膜  

Three-Wavelength High-Reflectivity Film for All-Solid-State 355-nm Ultraviolet Laser

作　　者：庄秋慧 王三强 Zhuang Qiuhui;Wang Sanqiang(College of Mechanical Engineering,Chongqing University of Technology,Chongqing 400050,China;State Grid Chongqing Electric Power Company Marketing Service Center,Chongqing 400020,China)

机构地区：[1]重庆理工大学机械工程学院,重庆400050 [2]国网重庆市电力公司营销服务中心,重庆400020

出　　处：《激光与光电子学进展》2021年第19期355-360,共6页Laser & Optoelectronics Progress

基　　金：重庆理工大学科研启动基金(2017ZD20)。

摘　　要：为了提高激光损伤阈值,采用离子束辅助电子束成膜的方法制备具有355,532,1064 nm三个波长的高反膜。首先使用Lambda950型分光光度计对薄膜样品的光谱性能进行测试,然后验证不同的基底材料及不同的基底清洗工艺对薄膜激光损伤阈值的影响,最后在不同的工作真空度下对薄膜的弱吸收能力和激光损伤阈值等进行较为系统的研究,分析薄膜的弱吸收能力与激光损伤阈值之间的联系。结果表明,三个波长下的反射率均满足全固态355 nm紫外激光器所要求的光学性能指标,当工作真空度增加到一定程度时,薄膜的激光损伤阈值与弱吸收值不再是对应的关系,而是存在一个最佳值,说明该高反膜可以用于全固态355 nm激光器中的反射镜。To increase the laser damage threshold,an ion-beam assisted electron-beam formation method is used for preparing high-reflection films with three wavelengths of 355,532,and 1064 nm.First,Lambda 950 spectrophotometer is used to test the spectral performance of the film sample.Then,the influence of different substrate materials and substrate cleaning processes on the laser damage threshold of the film are verified.Finally,the weak absorption capacity of the film and the laser damage threshold under different working vacuum degrees are studied systematically,and the relationship between the weak absorption capacity of the film and the laser damage threshold is analyzed.Additionally,the relationship between the weak absorption of the thin film and the laser damage threshold value is analyzed.The results show that the reflectance at the three wavelengths meets the requirement of optical performance indicators for the solid-state 355-nm ultraviolet laser.The laser damage threshold of the film and weak absorption value do not correspond to each other when the working vacuum increases to a certain level.However,an optimal value indicates that the high-reflection film can be used as the mirror in an allsolid-state 355-nm laser.

关 键 词：表面光学 薄膜光学 355 nm紫外激光器 离子束辅助电子束 激光损伤阈值 三波长高反膜 

分 类 号：O484.4[理学—固体物理]