制备工艺对超磁致伸缩Fe-Ga合金薄膜表面形貌的影响  

Influence of fabrication technology on surface morphology of giant magnetostrictive Fe-Ga alloy film

作　　者：沈智[1] 晏建武[1] 金康 周英丽 殷剑 Shen Zhi;Yan Jianwu;Jin Kang;Zhou Yingli;Yin Jian(School of Mechanical Engineering,Nanchang Institute of Technology,Nanchang Jiangxi 330099,China;Beijing Research Institute of Mechanical&Electrical Technology Ltd.,Beijing 100083,China;Beijing National Innovation Institute of Lightweight Ltd.,Beijing 100083,China)

机构地区：[1]南昌工程学院机械工程学院,江西南昌330099 [2]北京机电研究所有限公司,北京100083 [3]北京机科国创轻量化科学研究院有限公司,北京100083

出　　处：《金属热处理》2021年第11期236-240,共5页Heat Treatment of Metals

基　　金：江西省教育厅科技项目(GJJ201903);国家自然科学基金(51161019)。

摘　　要：采用JZCK-600F型多功能镀膜设备制备了Fe-Ga合金薄膜,研究了溅射工艺对Fe-Ga合金薄膜沉积速率及表面形貌的影响。用SEM、EDS研究了Fe-Ga合金薄膜的表面形貌和薄膜成分。当其他工艺参数不变时,溅射时间、溅射功率是影响Fe-Ga合金薄膜的厚度和生长速率的主要因素。随溅射时间和功率的增加,薄膜厚度和沉积速率也随之增加,并且薄膜厚度与溅射时间和功率呈现出正比例关系;但是薄膜厚度过大,加大的内应力会使薄膜剥离。溅射功率过大时,内应力同样会使薄膜内部出现裂纹。所制备Fe-Ga合金薄膜的磁畴图像明暗对比明显。磁畴形状呈现不太规则的团圈状,类似珊瑚结构。薄膜的结晶化生长良好,薄膜形貌为较均匀致密的颗粒状结构。优化的薄膜溅射工艺参数为溅射功率80 W、溅射工作气压0.6 Pa、溅射时间60 min、Ar气工作流量25 mL/min。采用此优化工艺制备的Fe-Ga合金磁致伸缩薄膜悬臂梁偏移量为69.048μm,可满足制备微器件所需性能。Fe-Ga alloy films were prepared by JZCK-600F multifunctional coating equipment,and the effect of sputtering technology on deposition rate and surface morphology of the Fe-Ga alloy films was investigated.The surface morphology and composition of the films were studied by SEM and EDS.The results show that sputtering time and power are the main factors that affect the thickness and growth rate of Fe-Ga alloy film when other process parameters are not changed.The thickness and deposition rate of the films increase with the increase of sputtering time and power and showing a positive proportional relationship between the film thickness and sputtering time and power.However,when the film thickness is too large,the increased internal stress may make the film peel off.When the sputtering power is too high,the internal stress may also induce inner cracks in the thin film.The magnetic domain images of Fe-Ga alloy films show obvious contrast between light and dark.The shape of the domain is irregular and round,similar to the structure of coral.The Fe-Ga alloy films prepared by magnetron sputtering have good crystallization and growth,and the morphology of the films is uniform and compact granular structure.The optimized sputtering parameters are sputtering power of 80 W,sputtering pressure of 0.6 Pa,sputtering time of 60 min and Ar gas flow of 25 mL/min.By which,the deflection of magnetostrictive thin film cantilever fabricated is 69.048μm,which can meet the requirements of the fabrication of micro-devices.

关 键 词：Fe-Ga合金薄膜 磁控溅射 表面形貌 磁畴结构 磁性能 

分 类 号：TB34[一般工业技术—材料科学与工程]