检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:王晨 梁勖[1] 林颖 方晓东 Wang Chen;Liang Xu;Lin Ying;Fang Xiaodong(Anhui Institute of Optics and Fine Mechanics,Hefei Institute of Physical Science,Chinese Academy of Sciences,Hefei 230031,China;University of Science and Technology of China,Hefei 230026,China;Shenzhen ShengFang Tech Co.,Ltd.,Shenzhen 518000,China)
机构地区:[1]中国科学院合肥物质科学研究院安徽光学精密机械研究所,安徽合肥230031 [2]中国科学技术大学,安徽合肥230026 [3]深圳盛方科技有限公司,广东深圳518000
出 处:《红外与激光工程》2021年第11期155-160,共6页Infrared and Laser Engineering
基 金:中国科学院青促会资助项目(2018481);深圳市科技计划项目(KQTD20170331115422184)。
摘 要:介绍了一种MOPA结构的准分子激光全隔离型、高精度的同步触发系统。首先,提出锁相环移相技术结合传统计脉冲的方法实现了系统的高分辨率与大范围;其次,采用全电气隔离的方式实现了系统在复杂的电磁干扰环境下长期稳定运行以及实时控制。系统主要参数达到分辨率1 ns、延时及脉宽调节范围0~325μs、各通道间的抖动<60 ps、前后沿<1.5 ns。同步触发系统应用于一套193 nm深紫外MOPA结构准分子激光装置,在4 kHz的高重频下实现了对MOPA双腔放电延时的精准实时控制,相对放电延时可严格控制在最佳时间段,放电时序抖动<±4 ns,最后成功获得PA腔对MO腔种子光的脉冲能量放大,最大放大率达到19.2,最大输出脉冲能量达到7.1 mJ,满足深紫外光刻应用需求。A fully isolated,high-precision synchronous trigger system with MOPA structure of excimer laser was introduced.Firstly,the phase-locked loop phase shift technology combined with the traditional pulse counting method was proposed to realize the high resolution and large range of the system;Secondly,the full electrical isolation way was used to achieve long-term stable operation and real-time control of the system in a complex electromagnetic interference environment.The main parameters of the system reached a resolution of 1 ns,a delay and pulse width adjustment range of 0-325μs,the jitter between each channel was less than 60 ps,and the front and back edges were less than 1.5 ns.Synchronous trigger system applied to a set of 193 nm deep ultraviolet MOPA structure excimer laser device.It realized the precise real-time control of MOPA dual cavity discharge sequence under the high repetition frequency of 4 kHz,the relative discharge delay can be strictly controlled in the best time period,the discharge timing jitter was less than±4 ns,and the pulse energy amplification of the MO cavity seed light was successfully obtained by the PA cavity.The magnification rate reached 19.2,and the maximum output pulse energy reached 7.1 mJ.It meets the needs of deep ultraviolet lithography applications.
分 类 号:TN248.2[电子电信—物理电子学]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.4