1280×1024 EMCCD纵向抗光晕设计  

Design of 1280×1024 vertical antiblooming EMCCD

作　　者：陈远金[1,2] 常维静 刘庆飞 戴放 王岭雪 Chen Yuanjin;Chang Weijing;Liu Qingfei;Dai Fang;Wang Lingxue(School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China;East China Institute of Optoelectronic Integrated Device,Suzhou 215163,China)

机构地区：[1]北京理工大学光电学院,北京100081 [2]华东光电集成器件研究所,江苏苏州215163

出　　处：《红外与激光工程》2021年第11期255-260,共6页Infrared and Laser Engineering

摘　　要：1 280×1 024 EMCCD是一种内线转移结构的固态微光成像器件,具备从星光条件到阳光环境的全天时成像探测能力,可广泛用于航天遥感、视觉感知和无人驾驶等领域。但由于器件饱和输出的限制,当入射光强度很高的情况下,EMCCD会发生光晕现象,造成图像分辨率降低,影响EMCCD获取目标信息的能力。为了提升EMCCD环境适应性,避免光晕现象的产生,文中分析了EMCCD光晕产生的原因,介绍了纵向抗晕的工作原理,通过理论推导分析和数值模拟仿真的方法,设计了具有纵向抗晕结构的EMCCD像元,制作了具有抗晕功能的1 280×1 024 EMCCD器件和原理演示样机,仿真数据和测试结果表明,文中设计的纵向抗光晕结构EMCCD具有500倍抗晕能力。1 280×1 024 EMCCD is a solid-state low light level imaging device with interline transfer structure.It has the ability of all-time imaging and detection from starlight to sunlight environment.It can be widely used in space remote sensing,visual perception and manless driving.However,due to the limitation of device saturation output,when the incident light intensity is too high for EMCCD,blooming takes place,resulting in the reduction of image resolution and affecting the ability of EMCCD to obtain target information.In order to improve the environmental adaptability of EMCCD and avoid the occurrence of blooming,the causes of EMCCD blooming was analyzed,the working principle of vertical antiblooming was introduced,EMCCD pixels with vertical antiblooming structure were designed through theoretical derivation,analysis and numerical simulation,and a 1 280×1 024 EMCCD device and principle demonstration prototype with vertical antiblooming function were produced.The simulation data and test results show that the vertical antiblooming EMCCD designed in this paper has 500 times antiblooming ability.

关 键 词：EMCCD 内线转移 光晕 饱和输出 抗晕能力 

分 类 号：TN386.5[电子电信—物理电子学]