Erratum:Magnetic Proximity Effect in an Antiferromagnetic Insulator/Topological Insulator Heterostructure with Sharp Interface[Chin.Phys.Lett.38(2021)057303]  

作　　者：Yuxin Liu Xuefan Niu Rencong Zhang Qinghua Zhangg Jing Teng Yongqing Li 刘宇新;牛雪翻;张仁聪;张庆华;滕静;李永庆(Beijing National Laboratory for Condensed Matter Physics,Institute of Physics,Chinese Academy of Sciences.Beijing 100190,China;School of Physical Sciences,University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]Beijing National Laboratory for Condensed Matter Physics,Institute of Physics,Chinese Acculcmy of Sciences.Beijing 100190,China [2]School of Physical Sciences,University of Chinese Acndcmy of Sciences,Beijing 100049,China

出　　处：《Chinese Physics Letters》2021年第10期70-70,共1页中国物理快报（英文版）

摘　　要：We should add the following acknowledge:Jing Teng thanks the support from the Youth Innovation Promotion Association Project,Chinese Academy of Sciences.

关 键 词：INSULATOR THANKS FERROMAGNETIC 

分 类 号：O469[理学—凝聚态物理] G23[理学—电子物理学]