基于灰度值评估法制备纳米CeO_(2)胶体射流抛光液  

Preparation of Nano-CeO_(2) Colloidal Jet Polishing Slurry Based on Gray Value Evaluation Method

作　　者：卢萍 侯荣国[1] 吕哲[1] 王湘田 王瑞 Lu Ping;Hou Rongguo;Lü Zhe;Wang Xiangtian;Wang Rui(College of Mechanical Engineering,Shandong University of Technology,Zibo 255000,China)

机构地区：[1]山东理工大学机械工程学院,山东淄博255000

出　　处：《半导体技术》2021年第12期962-968,共7页Semiconductor Technology

基　　金：山东省自然科学基金资助项目(ZR2020ME154)。

摘　　要：纳米胶体射流是抛光加工半导体材料的新型工艺方法,其中射流抛光液的分散稳定性对抛光效果有较大影响。以直径为10 nm的CeO_(2)为磨料,选取乙醇体积分数、聚乙烯吡络烷酮(PVP)质量分数和抛光液pH值为实验因素,利用图像灰度值法表征抛光液的分散稳定性,分析抛光液各组成参数对其分散稳定性的影响规律。利用Box-Behnken响应面法对纳米CeO_(2)胶体抛光液的分散稳定性条件进行优化。研究结果表明,纳米CeO_(2)胶体抛光液的最优分散条件为乙醇体积分数61%、PVP质量分数3%、抛光液pH值为10。在此最优条件下,制备的纳米胶体射流抛光液图像的灰度值为183,与响应面模型预测值非常吻合,且抛光液的分散性能良好且悬浮稳定。Nano colloidal jet is a new process method for polishing and processing semiconductor materials, in which the dispersion stability of the jet polishing slurry has a greater impact on the polishing effect.CeO_(2)with a diameter of 10 nm was used as the abrasive, and the volume fraction of ethanol, the mass fraction of polyvinylpyrrolidone(PVP) and the pH value of the polishing slurry were selected as the test factors.The image gray value method was used to characterize the dispersion stability of the poli-shing slurry, and the influence law of the composition parameters of the polishing slurry on its dispersion stability was analyzed.The Box-Behnken response surface method was used to optimize the dispersion stability conditions of the nano-CeO_(2)colloidal polishing slurry.The research results show that the optimal dispersion conditions of the nano-CeO_(2)colloidal polishing slurry are 61% ethanol volume fraction, 3% PVP mass fraction and pH value of 10 of the polishing slurry.Under the optimal condition, the image gray value of the prepared nano colloidal jet polishing slurry is 183,which is very consistent with the predicted value of the response surface model, and the dispersion performance of the polishing slurry is good and the suspension is stable.

关 键 词：半导体抛光 纳米胶体射流抛光液 分散稳定性 灰度值 响应面法 

分 类 号：TN305[电子电信—物理电子学]