宽角度入射近紫外反射镜的膜系优化设计与制备  

Optimization Design and Preparation of Wide Angle Incidence Near UV Reflector

作　　者：宋光辉[1] 李文龙[1] 王银河[1] 胡雯雯[1] 姚春龙[1] 刘海涛 SONG Guang-hui;LI Wen-long;WANG Yin-he;HU Wen-wen;YAO Chun-long;LIU Hai-tao(Shenyang Acadamy of Instrumentaion Science Co.,Ltd.,Shenyang 110041,China)

机构地区：[1]沈阳仪表科学研究院有限公司,辽宁沈阳110041

出　　处：《真空》2021年第6期38-42,共5页Vacuum

摘　　要：本文以规整膜系为基础,使用膜系软件进行优化,设计出满足投影光刻机紫外光学系统用宽角度入射近紫外反射镜使用要求的多层介质膜系。基于平面行星式转动机构,计算出平面紫外反射镜直径400mm以内的膜厚分布,通过对膜厚均匀性修正技术研究,实现镜片表面膜厚光谱曲线偏差小于5nm。In this paper,based on the structured film system and using the film system software to optimize the design,a multilayer medium film system is designed to meet the requirements of wide angle incidence near ultraviolet reflector used in the UV system of the projection photolithography machine.Based on the planet-type rotating mechanism,the film thickness distribution within 400 mm in the diameter of the plane near-ultraviolet reflector was calculated.Through the research on the film thickness uniformity correction technology,the spectral curve deviation of the film thickness on the lens surface was realized to be less than5 nm.

关 键 词：近紫外 宽入射角度 膜系设计 均匀性 

分 类 号：O484[理学—固体物理] TN305.8[理学—物理]