脉冲偏压频率对TiSiN/TiAlN纳米多层膜结构和性能的影响规律  

Effects of Pulse Bias Frequency on the Microstructure and Properties of TiSiN/TiAlN Nano-Multilayer Films

作　　者：魏永强 游业豪 蒋志强 WEI Yong-qiang;YOU Ye-hao;JIANG Zhi-qiang(School of Aeronautics and Astronautics,Zhengzhou University of Aeronautics,Zhengzhou 450015,China)

机构地区：[1]郑州航空工业管理学院航空工程学院,郑州450015

出　　处：《表面技术》2021年第12期311-319,共9页Surface Technology

基　　金：国家自然科学基金(51401182);航空科学基金(2016ZE55013);河南省高等学校重点科研项目指导计划(22B430030)。

摘　　要：目的研究脉冲偏压频率对Ti SiN/TiAlN纳米多层薄膜结构和性能的影响,优化工艺参数,以提高薄膜的性能。方法采用脉冲偏压电弧离子镀,在M2高速钢和单晶硅基底上以不同脉冲偏压频率沉积Ti SiN/TiAlN纳米多层薄膜,采用扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射仪和纳米压痕仪,研究脉冲偏压频率对Ti SiN/TiAlN纳米多层薄膜的表面形貌、元素成分、截面形貌、相结构和纳米硬度的影响。结果 Ti Si N/TiAlN纳米多层薄膜表面的大颗粒直径主要集中在1μm以下,随着脉冲偏压频率的变化,大颗粒的数量为184~234,所占面积为40.686~63.87μm^(2);主要元素为Ti元素和N元素,所占原子比分别为48%和50%,Si和Al元素的含量较少;多层结构不明显,截面形貌可观察到柱状晶的细化,80 kHz时出现片状化结构;以(111)晶面为择优取向,晶粒尺寸在20 nm左右;纳米硬度为28.3~32.3 GPa,弹性模量为262.5~286.8GPa。结论 50kHz时,Ti SiN/TiAlN纳米多层薄膜表面大颗粒的数量最少,为184个;70kHz时大颗粒所占面积最小,为40.686μm;晶粒尺寸在50~60k Hz时发生细化,60k Hz时,晶粒尺寸达到最小值19.366 nm,纳米硬度和弹性模量分别达到最大值32.3 GPa和308.6 GPa,脉冲偏压频率的最佳频率范围为50~70 kHz。Effects of the pulse bias frequency on the microstructure and properties of TiSiN/TiAlN nano-multilayer films were investigated for optimizing the process parameters and improving the performances.The TiSiN/TiAlN nano-multilayer film were deposited by arc ion plating technology with defferent pulse bias frequency on M2 high-speed steel and monocrystalline silicon substrates.The surface morphology,element composition,cross-section morphology,phase structure and nanohardness of the TiSiN/TiAlN nano-multilayer films were investigate by scanning electron microscope(SEM),energy spectrometer(EDS),X-ray diffractometer and nanoindenter.The diameter of the macroparticles on the surface of the TiSiN/TiAlN nano-multilayer film was mainly concentrated below 1 μm.With the change of the pulse bias frequency,the number of macroparticles was 184~234,and the area was 40.686~63.87 μm^(2).The main elements of TiSiN/TiAlN nano-multilayer films were Ti and N,which reached to 48% and 50%,respectively.The contents of Si and Al were small.The multilayer structure was not obvious from the cross-sectional morphology,and columnar crystals of TiSiN/TiAlN nano-multilayer films refined.Flaky structure of the crystals appeared at 80 kHz.The TiSiN/TiAlN nano-multilayer films were crystallized with preferred orientation(111) crystallographic planes.The grain size was about 20 nm.The nano hardness was between 28.3~32.3 GPa,and the elastic modulus was between 262.5~286.8 GPa.The number of macroparticles on the surface of the TiSiN/TiAlN nano-multilayer films reached the minimium 184 at 50 kHz.The area occupied by macroparticles reached the minimium 40.686 μm^(2) at 70 kHz.the grain size was refined at 50~60 kHz.The grain size reached the minimum value of 19.366 nm at 60 k Hz.The nano-hardness and the elastic modulus reached the maximum values of 32.3 GPa and 308.6 GPa,respectively.50~70 kHz was the best the pulse bias frequency range.

关 键 词：电弧离子镀 纳米多层膜 TiSiN/TiAlN 脉冲偏压频率 纳米硬度 

分 类 号：TG174.4[金属学及工艺—金属表面处理]