基于等离子体电子枪的束-等离子体系统研究  

Study on Beam-Plasma System Based on Plasma Electron Gun

作　　者：杨生鹏 唐昌建[2] 王战亮[1] 夏玉玺[2] 常鸿 郭宏阳 宫玉彬[1] YANG Sheng-peng;TANG Chang-jian;WANG Zhan-liang;XIA Yu-xi;CHANG Hong;GUO Hong-yang;GONG Yu-bin(National Key Laboratory of Science and Technology on Vacuum Electronics,University of Electronic Science and Technology of China,Chengdu 611731,China;Key Laboratory of High Energy Density Physics and Technology(Ministry of Education),Sichuan University,Chengdu 610065,China;Chengdu QixingVacuum Coating Co.,Ltd,Chengdu 610042,China)

机构地区：[1]电子科技大学微波电真空器件国家级重点实验室,四川成都611731 [2]四川大学高能量密度物理及技术教育部重点实验室,四川成都610065 [3]成都齐兴真空镀膜技术有限公司,四川成都610042

出　　处：《真空电子技术》2021年第6期14-17,24,共5页Vacuum Electronics

基　　金：国家自然科学基金项目(61921002,92163204,61988102,62171098);四川省科技项目(2020YFSY0011);博士后创新人才支持计划(BX20200075)。

摘　　要：采用PIC模拟研究了基于等离子体电子枪的小型化束-等离子体系统,探索了等离子体电子枪发射电流随加速电压、阴极等离子体密度、电子束通道半径以及电子束通道长度的变化规律,展示了电子束在高密度等离子体中的聚焦传输行为。A miniaturized beam-plasma system based on a plasma electron gun is studied with PIC simulation.The effects of acceleration voltage,cathode plasma density,beam channel radius,and beam channel length on the emission beam current are explored.The behavior of focusing transmission of the electron beam in high density plasma is also exhibited.

关 键 词：束-等离子体系统 等离子体电子枪 PIC模拟 

分 类 号：O536[理学—等离子体物理]