CMP清洗传输机械手的优化设计  

Optimal Design of Delivering Robot Arm for Cleaning after CMP

作　　者：刘福强 张继静[1] 吴燕林 史霄[1] 李伟[1] LIU Fuqiang;ZHANG Jijing;WU Yanlin;SHI Xiao;LI Wei(The 45^(th) Research Institute of CETC,Beijing 100176,China)

机构地区：[1]中国电子科技集团公司第四十五研究所,北京100176

出　　处：《电子工业专用设备》2021年第6期64-68,共5页Equipment for Electronic Products Manufacturing

摘　　要：为了提高现有清洗机械手结构的适用性和可靠性,通过调研实际工况和有限元分析,对现有清洗机械手进行结构和尺寸优化。通过优化分析,晶圆的脱片和碎片风险得以降低,清洗机械手的适用性和可靠性得到了实质性提升。In order to enhance the suitability and reliability of the existing cleaner robot,this paper optimizes the structure and size of the existing cleaner robot by investigating the actual working conditions and finite element analysis.Through the optimization analysis,the risk of slip and broken up of the wafer is reduced,and the suitability and reliability are substantially improved.

关 键 词：清洗机械手 化学机械抛光(CMP) 有限元分析 

分 类 号：TN305[电子电信—物理电子学]