Study on thickness uniformity of Ta_(2)O_(5) film evaporated on the inner-face of a hemispherical substrate  

作　　者：XU Lingmao HE Yanchun LI Kun ZHOU Hui XIONG Yuqing 徐嶺茂;何延春;李坤;周晖;熊玉卿(Science and Technology on Vacuum Technology and Physics Laboratory,Lanzhou Institute of Physics,Lanzhou 730001,China)

机构地区：[1]Science and Technology on Vacuum Technology and Physics Laboratory,Lanzhou Institute of Physics,Lanzhou 730001,China

出　　处：《Optoelectronics Letters》2021年第11期673-677,共5页光电子快报（英文版）

基　　金：supported by the Foundation of Science and Technology on Vacuum Technology and Physics Laboratory (No.ZD171902)。

摘　　要：Theoretical analysis and experimental study on the thickness distribution of Ta_(2)O_(5) film evaporated on the inner-face of a hemispherical substrate are demonstrated. It is derived that the value of n/R and L/R influence the film thickness distribution(where R is the radius of the hemisphere, n and L are the horizontal distance and vertical height between the evaporation source and the center of the hemisphere, respectively). The whole hemispherical substrate can be coated when n≤L+R, otherwise there is a "blind area" on the substrate when the substrate is self-rotating. A hemispherical composite substrate with a radius of 200 mm is coated with Ta_(2)O_(5) protective film under a certain configuration, the thickness of Ta_(2)O_(5) film at the edge is 0.372 times the film at the vertex which shows that the evaporation characteristics of Ta_(2)O_(5) tend to be a point source.

关 键 词：Study on thickness uniformity of Ta_(2)O_(5)film evaporated on the inner-face of a hemispherical substrate 

分 类 号：TB383.2[一般工业技术—材料科学与工程]